Electrical Characteristics of Metal-Insulator-Semiconductor Structure Using a-C:H Films Fabricated by Dual Magnetron Sputtering

2018 ◽  
Vol 10 (3) ◽  
pp. 433-437
Author(s):  
Yong Seob Park ◽  
Nam-Hoon Kim ◽  
Soohyun Hwang ◽  
Jaehyeong Lee
2001 ◽  
Vol 40 (Part 2, No. 6A) ◽  
pp. L564-L566 ◽  
Author(s):  
Leejun Kim ◽  
Jinmo Kim ◽  
Hunjung Lee ◽  
Donggeun Jung ◽  
Yonghan Roh

1989 ◽  
Vol 168 (2) ◽  
pp. 157-163 ◽  
Author(s):  
B. Ullrich ◽  
F. Kuchar ◽  
R. Meisels ◽  
F. Olcaytug ◽  
A. Jachimowicz

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