Stochastic Simulation Studies of Line-Edge Roughness in Block Copolymer Lithography

2014 ◽  
Vol 14 (8) ◽  
pp. 6143-6145 ◽  
Author(s):  
Sang-Kon Kim
Keyword(s):  
Block Copolymer ◽  
Stochastic Simulation ◽  
Simulation Studies ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

scholarly journals Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

2020 ◽  
Vol 32 (6) ◽  
pp. 2399-2407 ◽  
Author(s):  
Daniel F. Sunday ◽  
Xuanxuan Chen ◽  
Thomas R. Albrecht ◽  
Derek Nowak ◽  
Paulina Rincon Delgadillo ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Three-dimensional line edge roughness in pre- and post-dry etch line and space patterns of block copolymer lithography

2020 ◽  
Vol 22 (2) ◽  
pp. 478-488
Author(s):  
Shubham Pinge ◽  
Yufeng Qiu ◽  
Victor Monreal ◽  
Durairaj Baskaran ◽  
Abhaiguru Ravirajan ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Block Copolymer ◽  
Large Scale ◽  
Three Dimensional ◽  
Coarse Grained ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Dry Etch ◽  
Block Copolymer Lithography ◽  
Symmetric Block

In this work, we employ large-scale coarse-grained molecular dynamics (CGMD) simulations to study the three-dimensional line edge roughness associated with line and space patterns of chemo-epitaxially directed symmetric block copolymers.

Block copolymer self-assembly assisted fabrication of laterally organized- and stacked- nanoarrays

2021 ◽  
Author(s):  
Vignesh Suresh ◽  
Ah Bian Chew ◽  
Christina Yuan Ling Tan ◽  
Hui Ru Tan
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
The Self ◽  
Functional Surfaces ◽  
Self Assembled ◽  
Block Copolymer Lithography ◽  
Unique Surface ◽  
Copolymer Lithography

Abstract Block copolymer (BCP) self-assembly processes are often seen as reliable techniques for advanced nanopatterning to achieve functional surfaces and create templates for nanofabrication. By taking advantage of the tunability in pitch, diameter and feature-to-feature separation of the self-assembled BCP features, complex, laterally organized- and stacked- multicomponent nanoarrays comprising of gold and polymer have been fabricated. The approaches not only demonstrate nanopatterning of up to two levels of hierarchy but also investigate how a variation in the feature-to-feature gap at the first hierarchy affects the self-assembly of polymer features at the second. Such BCP self-assembly enabled multicomponent nanoarray configurations are rarely achieved by other nanofabrication approaches and are particularly promising for pushing the boundaries of block copolymer lithography and in creating unique surface architectures and complex morphologies at the nanoscale.

Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography

Nanoscale ◽  
2018 ◽  
Vol 10 (21) ◽  
pp. 10005-10017 ◽  
Author(s):  
Katharina Brassat ◽  
Daniel Kool ◽  
Julius Bürger ◽  
Jörg K. N. Lindner
Keyword(s):  
Block Copolymer ◽  
Nanosphere Lithography ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Block copolymer lithography for the nanopatterning of Au, Pt and TiO2 surfaces is presented; by combining this technique with nanosphere lithography, we create hierarchical nanopores.

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