Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

2008 ◽  
Vol 26 (5) ◽  
pp. 1684 ◽  
Author(s):  
Yuk-Hong Ting ◽  
Sang-Min Park ◽  
Chi-Chun Liu ◽  
Xiaosong Liu ◽  
F. J. Himpsel ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Plasma Etch ◽  
Poly Methyl Methacrylate ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Switchable Block Copolymer Surfactants for Preparation of Reversibly Coagulatable and Redispersible Poly(methyl methacrylate) Latexes

2013 ◽  
Vol 46 (4) ◽  
pp. 1261-1267 ◽  
Author(s):  
Qi Zhang ◽  
Guoqiang Yu ◽  
Wen-Jun Wang ◽  
Haomiao Yuan ◽  
Bo-Geng Li ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Poly Methyl Methacrylate

Block copolymer self-assembly assisted fabrication of laterally organized- and stacked- nanoarrays

2021 ◽  
Author(s):  
Vignesh Suresh ◽  
Ah Bian Chew ◽  
Christina Yuan Ling Tan ◽  
Hui Ru Tan
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
The Self ◽  
Functional Surfaces ◽  
Self Assembled ◽  
Block Copolymer Lithography ◽  
Unique Surface ◽  
Copolymer Lithography

Abstract Block copolymer (BCP) self-assembly processes are often seen as reliable techniques for advanced nanopatterning to achieve functional surfaces and create templates for nanofabrication. By taking advantage of the tunability in pitch, diameter and feature-to-feature separation of the self-assembled BCP features, complex, laterally organized- and stacked- multicomponent nanoarrays comprising of gold and polymer have been fabricated. The approaches not only demonstrate nanopatterning of up to two levels of hierarchy but also investigate how a variation in the feature-to-feature gap at the first hierarchy affects the self-assembly of polymer features at the second. Such BCP self-assembly enabled multicomponent nanoarray configurations are rarely achieved by other nanofabrication approaches and are particularly promising for pushing the boundaries of block copolymer lithography and in creating unique surface architectures and complex morphologies at the nanoscale.

Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography

Nanoscale ◽  
2018 ◽  
Vol 10 (21) ◽  
pp. 10005-10017 ◽  
Author(s):  
Katharina Brassat ◽  
Daniel Kool ◽  
Julius Bürger ◽  
Jörg K. N. Lindner
Keyword(s):  
Block Copolymer ◽  
Nanosphere Lithography ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Block copolymer lithography for the nanopatterning of Au, Pt and TiO2 surfaces is presented; by combining this technique with nanosphere lithography, we create hierarchical nanopores.

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