An Overview on Structure and Field Emission Properties of Carbon Nitride Films

Journal of Nanomaterials ◽

10.1155/2014/203837 ◽

2014 ◽

Vol 2014 ◽

pp. 1-8 ◽

Cited By ~ 3

Author(s):

Qiong Wang ◽

Jinlong Jiang

Keyword(s):

Field Emission ◽

Carbon Nitride ◽

Synthetic Methods ◽

Nitride Film ◽

N Content ◽

Emission Properties ◽

Structure Characteristics ◽

Field Emission Properties ◽

Carbon Nitride Film ◽

Application Prospects

Carbon nitride films have excellent properties and wide application prospects in the aspect of field emission properties. In this review structure characteristics and a variety of synthetic methods of carbon nitride film will be described. In the carbon nitrogen films, we mainly from the following three points: sp2/sp3ratio, surface morphology and N content to discuss the change of field emission properties. Appropriate sp2/sp3(about 1.0–1.25) ratio, N content (about 8 at.%–10 at.%), and rough surfaces will strengthen the field emission properties.

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Field emission properties of carbon nitride synthesized by microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.12.030 ◽

2019 ◽

Vol 671 ◽

pp. 53-58

Author(s):

Ippei Tanaka ◽

Koudai Yarita ◽

Yukihiro Sakamoto

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Emission Properties ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Field emission properties of amorphous carbon nitride thin films prepared by arc ion plating

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01255-5 ◽

2001 ◽

Vol 142-144 ◽

pp. 714-718 ◽

Cited By ~ 7

Author(s):

Hiroyuki Sugimura ◽

Yoshiki Sato ◽

Nobuhiro Tajima ◽

Osamu Takai

Keyword(s):

Thin Films ◽

Field Emission ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Arc Ion Plating ◽

Emission Properties ◽

Ion Plating ◽

Field Emission Properties ◽

Amorphous Carbon Nitride

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Field emission properties of nanocomposite carbon nitride films

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1322043 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2698 ◽

Cited By ~ 14

Author(s):

I. Alexandrou ◽

M. Baxendale ◽

N. L. Rupesinghe ◽

G. A. J. Amaratunga ◽

C. J. Kiely

Keyword(s):

Field Emission ◽

Carbon Nitride ◽

Emission Properties ◽

Field Emission Properties

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Carbon nitride nanotubes synthesized by high-frequency induction heating quickly and their field-emission properties

2008 2nd IEEE International Nanoelectronics Conference ◽

10.1109/inec.2008.4585643 ◽

2008 ◽

Author(s):

Zijiong Li ◽

Liangming Wei ◽

Ping Liu ◽

Yafei Zhang

Keyword(s):

Field Emission ◽

Induction Heating ◽

High Frequency ◽

Carbon Nitride ◽

Emission Properties ◽

Field Emission Properties ◽

High Frequency Induction

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Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2360980 ◽

2006 ◽

Vol 24 (6) ◽

pp. 2570 ◽

Cited By ~ 3

Author(s):

Junjie Li ◽

Hidenori Mimura ◽

Yoichiro Neo ◽

Changzhi Gu ◽

Haijun Li ◽

...

Keyword(s):

Field Emission ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Reactive Nitrogen ◽

Nitrogen Gas ◽

Emission Properties ◽

Field Emission Properties ◽

Amorphous Carbon Nitride

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Electron affinity and field emission characteristics of boron carbon nitride film

Diamond and Related Materials ◽

10.1016/j.diamond.2004.09.009 ◽

2005 ◽

Vol 14 (3-7) ◽

pp. 719-723 ◽

Cited By ~ 26

Author(s):

Chiharu Kimura ◽

Kunitaka Okada ◽

Shingo Funakawa ◽

Shinichiro Sakata ◽

Takashi Sugino

Keyword(s):

Field Emission ◽

Electron Affinity ◽

Carbon Nitride ◽

Nitride Film ◽

Emission Characteristics ◽

Carbon Nitride Film ◽

Boron Carbon Nitride ◽

Boron Carbon

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Electron field emission from silicon tip arrays coated by magnetron sputtering carbon nitride film

Solid State Communications ◽

10.1016/j.ssc.2004.07.036 ◽

2004 ◽

Vol 132 (3-4) ◽

pp. 253-257 ◽

Cited By ~ 5

Author(s):

J.J. Li ◽

W.T. Zheng ◽

C.Z. Gu ◽

Z.S. Jin

Keyword(s):

Magnetron Sputtering ◽

Field Emission ◽

Carbon Nitride ◽

Nitride Film ◽

Electron Field Emission ◽

Carbon Nitride Film ◽

Electron Field

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Field emission properties of diamond-like carbon and carbon nitride films deposited by the electrochemical method

Acta Physica Sinica ◽

10.7498/aps.54.3935 ◽

2005 ◽

Vol 54 (8) ◽

pp. 3935

Author(s):

Ye Fan ◽

Xie Er-Qing ◽

Li Rui-Shan ◽

Lin Hong-Feng ◽

Zhang Jun ◽

...

Keyword(s):

Field Emission ◽

Electrochemical Method ◽

Carbon Nitride ◽

Diamond Like Carbon ◽

Emission Properties ◽

Field Emission Properties

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Effect of the Distribution of the Radiation Defect on the Field-Emission Properties of Silicon Crystals

Микроэлектроника ◽

10.31857/s054412690001651-3 ◽

2018 ◽

Vol 47 (4) ◽

pp. 32-39

Author(s):

R. Yafarov ◽

◽

V. Timoshenkov ◽

Keyword(s):

Field Emission ◽

Radiation Defect ◽

Emission Properties ◽

Field Emission Properties ◽

Silicon Crystals

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The Field Emission Properties of Multi-Wall Carbon Nanotubes on Flexible Carbon Cloth Substrate with Different Interlayers

Current Nanoscience ◽

10.2174/1573413709666140109001928 ◽

2014 ◽

Vol 10 (4) ◽

pp. 497-503

Author(s):

Tsung-Chieh Cheng ◽

Tao-Hsing Chen ◽

Wen-Shih Lin ◽

Chin-Hsiang Cheng

Keyword(s):

Carbon Nanotubes ◽

Field Emission ◽

Carbon Cloth ◽

Emission Properties ◽

Multi Wall Carbon Nanotubes ◽

Field Emission Properties

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