C-5 Absolute Thickness Determination of SMCO Films on Silicon Substrates Utilizing X-ray Diffraction and Their Composition Measurements By EXRF

2009 ◽  
Vol 24 (2) ◽  
pp. 172-172
Author(s):  
I. Vander ◽  
F.J. Cadieu
Keyword(s):  
Silicon Substrates ◽  
X Ray Diffraction ◽  
X Ray ◽  
Thickness Determination ◽  
Composition Measurements

scholarly journals Thickness Determination of Surface Film for Textured Specimens by X-ray Diffraction

1997 ◽  
Vol 30 (1-2) ◽  
pp. 71-79 ◽  
Author(s):  
Liu Yu-Shu ◽  
Zhao Yu
Keyword(s):  
Surface Film ◽  
Diffraction Method ◽  
X Ray Diffraction ◽  
X Ray ◽  
Thickness Determination

A simple and convenient X-ray diffraction method is proposed to determine the thickness of surface film for textured specimens. The analysis result for a synthetic specimen with surface film has proved that the method is applicable and reliable.

Thickness Determination of LB Films by X-Ray Diffraction

1989 ◽  
Vol 28 (Part 1, No. 10) ◽  
pp. 1926-1927
Author(s):  
Shuji Okada ◽  
Hachiro Nakanishi ◽  
Hiro Matsuda ◽  
Masao Kato ◽  
Tsutomu Nishiyama
Keyword(s):  
X Ray Diffraction ◽  
Lb Films ◽  
X Ray ◽  
Thickness Determination

Thickness determination of SmCo films on silicon substrates utilizing X-ray diffraction

2010 ◽  
Vol 25 (2) ◽  
pp. 149-153
Author(s):  
Isaac Vander ◽  
R. W. Zuneska ◽  
F. J. Cadieu
Keyword(s):  
Single Crystal Silicon ◽  
Magnetic Films ◽  
Mass Attenuation Coefficient ◽  
Silicon Substrates ◽  
Film Material ◽  
X Ray Diffraction ◽  
Crystal Silicon ◽  
X Ray ◽  
Si Substrates

This paper presents a nondestructive measurement technique for the determination of the film thicknesses of Co and SmCo based magnetic films deposited by sputtering on single-crystal silicon (100) substrates. X-ray diffraction of Cu Kα radiation has been used to measure the intensity of the (400) reflection from bare silicon substrates and as attenuated by sputter coated Co and SmCo based films on Si substrates. A four-axis research diffractometer allowed the substrate orientation to be fine adjusted to maximize the (400) diffraction intensity. The thickness of SmCo based films was in a range from 0.05 to 5 μm. Co film thicknesses on Si could be measured to a few tens of nanometers. The accuracy of the thickness measurements depends on the effective mass attenuation coefficient of the film material. For the materials considered, the thicknesses determined by the X-ray attenuation method agree within at least several percent to values determined by other methods.

Critical Thickness Determination of II-VI Semiconductors by Rheed and X-Ray Diffraction

1995 ◽  
Vol 182-184 ◽  
pp. 147-150 ◽  
Author(s):  
D. Reisinger ◽  
M.J. Kastner ◽  
K. Wolf ◽  
H. Steinkirchner ◽  
W. Häckl ◽  
...  
Keyword(s):  
Critical Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Thickness Determination

Thickness of Polycrystalline Copper Coating Measured by X-Ray Diffraction

2010 ◽  
Vol 163 ◽  
pp. 9-12 ◽  
Author(s):  
S.J. Skrzypek ◽  
M. Goły ◽  
J. Kowalska ◽  
K. Chruściel
Keyword(s):  
Incidence Angle ◽  
Grazing Incidence ◽  
Thin Layers ◽  
Circuit Board ◽  
Metallic Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Thickness Determination ◽  
Copper Coatings

Electrodeposition and other methods are employed to obtain metallic films and coatings. Copper coatings are most extensively used in circuit board industry and often as a base to further formation of other metallic films. Electrodeposited copper films (thin layers) are widely used in electronic and automotive industry so its electrical and mechanical properties and its thickness are important. Several methods are used for thickness determination of thin films and coatings for example mechanical, magnetic and ball crater with light microscopy methods. They are destructive and not precise enough. The X-ray fluorescence, absorption and diffraction are more frequently used due to better precision. Although they are complex and expensive, they pronounce an important feature like non-destructive character. For particular cases geometrical conditions and mathematical calculation procedure must be elaborated. An application of X-ray diffraction in grazing incidence angle for thickness determination is described in this article. The method is based on absorption principles of X-ray beam. The absorption is proportional to thickness of the coating and to incidence and to the diffraction angle which. Geometrical conditions were obtained experimentally and suitable mathematical calculations were introduced. The elaborated methodical approach was applied to thickness determination of copper coatings electrodeposited on a brass substrate.

Sem and X-Ray Analysis of Renal and Biliary Calculi

1976 ◽  
Vol 34 ◽  
pp. 306-307
Author(s):  
R. J. Narconis ◽  
G. L. Johnson
Keyword(s):  
Chemical Constituents ◽  
Natural State ◽  
X Ray Diffraction ◽  
Chemical Methods ◽  
X Ray ◽  
Additional Dimension ◽  
Biliary Calculi ◽  
Calculus Formation ◽  
Scanning Electron

Analysis of the constituents of renal and biliary calculi may be of help in the management of patients with calculous disease. Several methods of analysis are available for identifying these constituents. Most common are chemical methods, optical crystallography, x-ray diffraction, and infrared spectroscopy. The application of a SEM with x-ray analysis capabilities should be considered as an additional alternative.A scanning electron microscope equipped with an x-ray “mapping” attachment offers an additional dimension in its ability to locate elemental constituents geographically, and thus, provide a clue in determination of possible metabolic etiology in calculus formation. The ability of this method to give an undisturbed view of adjacent layers of elements in their natural state is of advantage in determining the sequence of formation of subsequent layers of chemical constituents.

New Coordination Compounds of Fe(III) with Organic Ligands

2009 ◽  
Vol 59 (12) ◽  
Author(s):  
Mihaela Flondor ◽  
Ioan Rosca ◽  
Doina Sibiescu ◽  
Mihaela-Aurelia Vizitiu ◽  
Daniel-Mircea Sutiman ◽  
...  
Keyword(s):  
Chemical Analysis ◽  
Complex Compounds ◽  
Organic Ligands ◽  
X Ray Diffraction ◽  
X Ray ◽  
Elemental Chemical Analysis ◽  
Structural Formulae ◽  
Paramagnetic Properties

In this paper the synthesis and the study of some complex compounds of Fe(III) with ligands derived from: 2-(4-chloro-phenylsulfanyl)-1-(2-hydroxy-3,5-diiodo-phenyl)-ethanone (HL1), 1-(3,5-dibromo-2-hydroxy-phenyl)-2-phenylsulfanyl-ethanone(HL2), and 2-(4-chloro-phenylsulfanyl)-1-(3,5-dibromo-2-hydroxy-phenyl)-ethanone (HL3) is presented. The characterization of these complexes is based on method as: the elemental chemical analysis, IR and ESR spectroscopy, M�ssbauer, the thermogravimetric analysis and X-ray diffraction. Study of the IR and chemical analysis has evidenced that the precipitates form are a complexes and the combination ratio of M:L is 1:2. The central atoms of Fe(III) presented paramagnetic properties and a octaedric hybridization. Starting from this precipitation reactions, a method for the gravimetric determination of Fe(III) with this organic ligands has been possible. Based on the experimental data on literature indications, the structural formulae of the complex compounds are assigned.

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