Influences of Organic Additive Molecular Weight in Colloidal-Silica-Based Slurry on Final Polishing Characteristics of Silicon Wafer

2011 ◽  
Vol 159 (2) ◽  
pp. H107-H111 ◽  
Author(s):  
Byeong-Sam Moon ◽  
Hee-Sub Hwang ◽  
Jea-Gun Park
Keyword(s):  
Molecular Weight ◽  
Silicon Wafer ◽  
Colloidal Silica ◽  
Organic Additive

Experimental Study on Parameter Optimization of Silicon Wafer CMP Using Composite Abrasives Slurry

2009 ◽  
Vol 69-70 ◽  
pp. 214-218
Author(s):  
Xue Feng Xu ◽  
H.T. Ma ◽  
B.X. Ma ◽  
Wei Peng
Keyword(s):  
Silicon Wafer ◽  
Material Removal Rate ◽  
Material Removal ◽  
Colloidal Silica ◽  
Rotation Speed ◽  
Removal Rate ◽  
Polymer Particle ◽  
Optimal Parameters ◽  
Polymer Particles ◽  
Mechanism Of Interaction

In order to increase the material removal rate of silicon wafer, composite abrasives slurry was used in CMP. The mechanism of interaction between silica abrasives and polymer particles was analyzed. Small silica abrasives were seen to attach onto the surface of the polymer particles. Composite abrasives slurry was obtained by adding polymer particles into single abrasive slurry. Three key parameters, the concentration of colloidal silica, the concentration of polymer particle and the speed of polishing, which influence the material removal rate of silicon wafer were analyzed by Taguchi method and the optimal parameters were obtained. Experimental results indicated that the maximum material removed rate of 353nm/min was obtained when optimal craft parameters of 5% colloidal silica, 3% polymer particle, 50rpm plate and carrier rotation speed were selected.

CONSTRUCTION AND USE OF A SEMIMICRO LIGHT-SCATTERING APPARATUS

1953 ◽  
Vol 31 (11) ◽  
pp. 1078-1092 ◽  
Author(s):  
D. A. I. Goring
Keyword(s):  
Molecular Weight ◽  
Light Scattering ◽  
Rayleigh Scattering ◽  
Colloidal Silica ◽  
Incident Beam ◽  
Calibration Factor ◽  
Scattering System

A light-scattering apparatus requiring only 4 ml. of liquid was designed and built. The device has permitted the measurement of intensity for angles between [Formula: see text] and 135° to the incident beam. In this range the unpolarized, horizontal, and vertical components of the light emitted from a solution of fluorescein were constant to within ± 0.2%, 0.4%, and 0.6% respectively. The apparatus was calibrated with a suspension of Ludox colloidal silica which absorbed no light for λ = 3800 Å to 6000 Å. The suspension was found to possess all the properties of a Rayleigh scattering system except randomness. This condition was achieved by extrapolating the light-scattering and spectrophotometric functions to zero concentration when computing the calibration factor. The molecular weight of a sample of sodium carrageenate, determined by the method of Zimm, was 1,700,000. The distribution of intensity at. zero concentration fell between that for stiff rods and polydisperse coils.

Influence of molecular weight on PNIPAM brush modified colloidal silica particles

Soft Matter ◽  
2019 ◽  
Vol 15 (1) ◽  
pp. 55-64 ◽  
Author(s):  
Ben A. Humphreys ◽  
Stuart W. Prescott ◽  
Timothy J. Murdoch ◽  
Andrew Nelson ◽  
Elliot P. Gilbert ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Internal Structure ◽  
Colloidal Silica ◽  
Silica Particles ◽  
Modified Silica

The internal structure of PNIPAM brush modified silica particles has been probed as a function of temperature and molecular weight.

Emulsion Polymerized Polydimethylsiloxane

1983 ◽  
Vol 56 (5) ◽  
pp. 918-926 ◽  
Author(s):  
Daniel Graivek ◽  
David J. Huebner ◽  
John C. Saam
Keyword(s):  
Molecular Weight ◽  
Room Temperature ◽  
Colloidal Silica ◽  
Water Interface ◽  
Hard Phase ◽  
Crosslinking Process ◽  
Additional Stabilization ◽  
Alkaline Conditions ◽  
Oil Water ◽  
Emulsion Particle

Abstract The observations are consistent with the formation of grafts of hydrophilic silicates to the silanol chain ends at the surface of the PDMS emulsion particles prior to removal of the water. The silicates may be introduced into the system directly or through the alkaline colloidal silica, which contains appreciable amounts of dissolved silicates. Monomeric, or possibly dimeric, silicate grafted to more than one chain end could migrate to the interior of the PDMS emulsion particle to form further crosslinks. Grafts to higher molecular weight silicates and silicate grafts bearing anionic change would be solvated with water and tend to remain at the oil-water interface. These grafts can provide additional stabilization to the cured particles. The dialkyltin carboxylate is pictured as playing a role in the grafting and crosslinking process. Evaporation of the water would eventually cause collapse of the stabilizing elements surrounding the PDMS particles to allow contact between particles of silica and the silicate grafts coating the particles of PDMS. The ensuing formation of interparticle hydrogen bonds and siloxane bonds, which can occur readily at room temperature under alkaline conditions, completes the formation of the elastomer network. This is represented in Figure 8. The resulting elastomeric network thus consists of the original emulsion particles, now crosslinked, which are surrounded by a hydrophilic hard phase of silicates and silica. In some aspects, this resembles the morphology proposed for films from dried natural latex.

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