Abrasive-Free Polishing of Single-Crystal 4H-SiC with Silica Glass Plates

2015 ◽  
Vol 4 (12) ◽  
pp. P468-P475 ◽  
Author(s):  
Akihisa Kubota ◽  
Yuta Hatasako ◽  
Takahiro Takita ◽  
Mutsumi Touge
2021 ◽  
Vol 11 (15) ◽  
pp. 6733
Author(s):  
Mira Naftaly ◽  
Andrew Gregory

Z-cut single-crystal quartz and vitreous silica (silica glass or fused silica) were evaluated for use as reference materials for terahertz and microwave measurements of complex permittivity, with Z-cut quartz confirmed as being suitable. Measurements of refractive indices and absorption coefficients for o-ray and e-ray in quartz and for vitreous silica are reported at frequencies between 0.2 and 6 THz and at 36 and 144 GHz, and compared with data reported in the literature. A previously unreported broad band was seen in the extraordinary absorption of quartz. The Boson peak in silica glass absorption was examined, and for the first time, two negative relationships have been observed: between the refractive index and the Boson peak frequency, and between the Boson peak height and its frequency.


1992 ◽  
Vol 271 ◽  
Author(s):  
Hiroshi Hirashima ◽  
Takao Kusaka

ABSTRUCTThe sol-gel method is one of the most appropriate technologies for the preparation of functional thin oxide coatings. However, few studies on the structure near the interface between sol-gel coatings and substrates have been reported. In this study, the structures of thin TiO2 gel coatings were investigated by XPS in order to elucidate the interaction between the coatings and the glass substrates. TiO2 gel coatings were prepared from Ti-alkoxide by hydrolysis and dip-coating on silica glass plates. Thickness and refractive index measurements were made by ellipsometry. Changes in Ols spectra for the coatings were observed at locations near the interface. Dynamic microhardness measurements for the coatings and the coated glasses were made. These results suggest the formation of a Ti-O-Si bond at the interface.


2005 ◽  
Vol 19 (05) ◽  
pp. 225-238 ◽  
Author(s):  
YASUHIKO SHIMOTSUMA ◽  
KAZUYUKI HIRAO ◽  
JIARONG QIU ◽  
PETER G. KAZANSKY

Periodic nanostructures along the polarization direction of light are observed inside silica glasses and tellurium dioxide single crystal after irradiation by a focused single femtosecond laser beam. Backscattering electron images of the irradiated spot inside silica glass reveal a periodic structure of stripe-like regions of ~20 nm width with a low oxygen concentration. In the case of the tellurium dioxide single crystal, secondary electron images within the focal spot show the formation of a periodic structure of voids with ~30 nm width. Oxygen defects in a silica glass and voids in a tellurium dioxide single crystal are aligned perpendicular to the laser polarization direction. These are the smallest nanostructures below the diffraction limit of light, which are formed inside transparent materials. The phenomenon is interpreted in terms of interference between the incident light field and the electric field of electron plasma wave generated in the bulk of material.


2003 ◽  
Vol 107 (33) ◽  
pp. 8281-8284 ◽  
Author(s):  
Hyunsoo So ◽  
Kwang Ha ◽  
Yun-Jo Lee ◽  
Kyung Byung Yoon ◽  
R. Linn Belford

Author(s):  
Akira Tanaka ◽  
David F. Harling

In the previous paper, the author reported on a technique for preparing vapor-deposited single crystal films as high resolution standards for electron microscopy. The present paper is intended to describe the preparation of several high resolution standards for dark field microscopy and also to mention some results obtained from these studies. Three preparations were used initially: 1.) Graphitized carbon black, 2.) Epitaxially grown particles of different metals prepared by vapor deposition, and 3.) Particles grown epitaxially on the edge of micro-holes formed in a gold single crystal film.The authors successfully obtained dark field micrographs demonstrating the 3.4Å lattice spacing of graphitized carbon black and the Au single crystal (111) lattice of 2.35Å. The latter spacing is especially suitable for dark field imaging because of its preparation, as in 3.), above. After the deposited film of Au (001) orientation is prepared at 400°C the substrate temperature is raised, resulting in the formation of many square micro-holes caused by partial evaporation of the Au film.


Author(s):  
L. E. Murr ◽  
G. Wong

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.


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