(Invited) High Throughput Atomic Layer Deposition for Encapsulation of Large Area Electronics

2019 ◽  
Vol 41 (2) ◽  
pp. 195-201 ◽  
Author(s):  
Jacques Kools
Keyword(s):  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Large Area ◽  
Layer Deposition ◽  
Large Area Electronics

71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al2O3as a Moisture Barrier for Flexible OLED Display

2015 ◽  
Vol 46 (1) ◽  
pp. 1043-1046 ◽  
Author(s):  
Hagyoung Choi ◽  
Seokyooon Shin ◽  
Yonghyuk Choi ◽  
Yeongtae Choi ◽  
Junghun Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Moisture Barrier ◽  
Layer Deposition ◽  
Oled Display

Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics

2020 ◽  
Vol 12 (32) ◽  
pp. 36688-36694
Author(s):  
Jaebeom Lee ◽  
Arul V. Ravichandran ◽  
Jaidah Mohan ◽  
Lanxia Cheng ◽  
Antonio T. Lucero ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Large Area ◽  
Layer Deposition

scholarly journals An Atomic Layer Deposition Method to Fabricate Economical and Robust Large Area Microchannel Plates for Photodetectors

2012 ◽  
Vol 37 ◽  
pp. 722-732 ◽  
Author(s):  
Anil U. Mane ◽  
Qing Peng ◽  
Jeffrey W. Elam ◽  
Daniel C. Bennis ◽  
Christopher A. Craven ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Large Area ◽  
Microchannel Plates ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

scholarly journals Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars

2011 ◽  
Vol 19 (27) ◽  
pp. 26056 ◽  
Author(s):  
Joshua D. Caldwell ◽  
Orest J. Glembocki ◽  
Francisco J. Bezares ◽  
Maarit I. Kariniemi ◽  
Jaakko T. Niinistö ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hot Spot ◽  
Atomic Layer ◽  
Large Area ◽  
Periodic Arrays ◽  
Layer Deposition

Spatially separated atomic layer deposition of Al2 O3 , a new option for high-throughput Si solar cell passivation

2011 ◽  
Vol 19 (6) ◽  
pp. 733-739 ◽  
Author(s):  
B. Vermang ◽  
A. Rothschild ◽  
A. Racz ◽  
J. John ◽  
J. Poortmans ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Si Solar Cell ◽  
Layer Deposition
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