Spatially separated atomic layer deposition of Al2 O3 , a new option for high-throughput Si solar cell passivation

2011 ◽  
Vol 19 (6) ◽  
pp. 733-739 ◽  
Author(s):  
B. Vermang ◽  
A. Rothschild ◽  
A. Racz ◽  
J. John ◽  
J. Poortmans ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Si Solar Cell ◽  
Layer Deposition

High Throughput, Low Cost Deposition of Alumina Passivation Layers by Spatial Atomic Layer Deposition

2011 ◽  
Vol 1323 ◽  
Author(s):  
Ad Vermeer ◽  
F. Roozeboom ◽  
P. Poodt ◽  
Roger Gortzen
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
High Throughput ◽  
Crystalline Silicon ◽  
Low Cost ◽  
Atomic Layer ◽  
Alumina Layer ◽  
Crystalline Silicon Solar Cells ◽  
Cell Efficiency ◽  
Layer Deposition

ABSTRACTAtomic Layer Deposition (ALD) is a gas phase deposition technique for depositing very high quality thin films with an unsurpassed conformality. The main drawback of ALD however is the very low deposition rate (~ 1 nm/min). Recently, record deposition rates for alumina of up to 1 nm/s were reached using spatial ALD, while maintaining the typical assets regarding film quality as obtained by conventional, slow ALD [1]. This allows for ALD at high throughput numbers.One interesting application is passivation of crystalline silicon solar cells. Applying a thin alumina layer is reported to increase solar cell efficiency and enables the use of thinner wafers, thus reducing the main cost factor [2]. In this paper we report on the latest progress made by SoLayTec that delivered a working prototype of a system realizing full area single sided deposition of alumina on 156 x 156 mm2, mono- and multi crystalline silicon wafers for solar cell applications. The alumina layers showed excellent passivation. Based on this concept, a high-throughput ALD deposition tool is being developed targeting throughput numbers of up to 3000 wafers/hr, making ALD ready for mass production. This will bring on new opportunities in other applications.

71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al2O3as a Moisture Barrier for Flexible OLED Display

2015 ◽  
Vol 46 (1) ◽  
pp. 1043-1046 ◽  
Author(s):  
Hagyoung Choi ◽  
Seokyooon Shin ◽  
Yonghyuk Choi ◽  
Yeongtae Choi ◽  
Junghun Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Moisture Barrier ◽  
Layer Deposition ◽  
Oled Display

Toward an all-Atomic Layer Deposition (ALD) process for Cu(In,Ga)(S,Se)2 (CIGS)-type solar cell

2019 ◽  
Vol 200 ◽  
pp. 109965 ◽  
Author(s):  
Harold Le Tulzo ◽  
Nathanaelle Schneider ◽  
Daniel Lincot ◽  
Frédérique Donsanti
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Surface Passivation of Nanoporous TiO2 via Atomic Layer Deposition of ZrO2 for Solid-State Dye-Sensitized Solar Cell Applications

2009 ◽  
Vol 113 (42) ◽  
pp. 18385-18390 ◽  
Author(s):  
Tina C. Li ◽  
Márcio S. Góes ◽  
Francisco Fabregat-Santiago ◽  
Juan Bisquert ◽  
Paulo R. Bueno ◽  
...  
Keyword(s):  
Solar Cell ◽  
Solid State ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Dye Sensitized Solar Cell ◽  
Dye Sensitized ◽  
Layer Deposition
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