71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al2O3as a Moisture Barrier for Flexible OLED Display

2015 ◽  
Vol 46 (1) ◽  
pp. 1043-1046 ◽  
Author(s):  
Hagyoung Choi ◽  
Seokyooon Shin ◽  
Yonghyuk Choi ◽  
Yeongtae Choi ◽  
Junghun Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Moisture Barrier ◽  
Layer Deposition ◽  
Oled Display

Spatially separated atomic layer deposition of Al2 O3 , a new option for high-throughput Si solar cell passivation

2011 ◽  
Vol 19 (6) ◽  
pp. 733-739 ◽  
Author(s):  
B. Vermang ◽  
A. Rothschild ◽  
A. Racz ◽  
J. John ◽  
J. Poortmans ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer Deposition ◽  
High Throughput ◽  
Atomic Layer ◽  
Si Solar Cell ◽  
Layer Deposition

Moisture Barrier Properties of Al2O3Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures

2013 ◽  
Vol 52 (3R) ◽  
pp. 035502 ◽  
Author(s):  
Hagyoung Choi ◽  
Sanghun Lee ◽  
Hyunsoo Jung ◽  
Seokyoon Shin ◽  
Giyul Ham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Barrier Properties ◽  
Remote Plasma ◽  
Moisture Barrier ◽  
Layer Deposition
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