Photoluminescence in Non-Stoichiometric Silicon Nitride Films Obtained by Reactive Sputtering

Guilherme Sombrio; Antônio Eudócio P. De Mattos; Paulo L. Franzen; Marcelo B. Pereira; Henri I. Boudinov

doi:10.1149/1.3615208

Photoluminescence in Non-Stoichiometric Silicon Nitride Films Obtained by Reactive Sputtering

ECS Transactions ◽

10.1149/1.3615208 ◽

2019 ◽

Vol 39 (1) ◽

pp. 315-320 ◽

Cited By ~ 2

Author(s):

Guilherme Sombrio ◽

Antônio Eudócio P. De Mattos ◽

Paulo L. Franzen ◽

Marcelo B. Pereira ◽

Henri I. Boudinov

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films

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Deposition of Silicon Nitride Films by High Rate Reactive Sputtering

10.7567/ssdm.1979.a-1-9 ◽

1979 ◽

Author(s):

Y. Hoshi ◽

M. Naoe ◽

S. Yamanaka

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

High Rate ◽

Silicon Nitride Films

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Silicon Nitride Films by Reactive Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.2426749 ◽

1967 ◽

Vol 114 (8) ◽

pp. 826 ◽

Cited By ~ 43

Author(s):

S. M. Hu ◽

L. V. Gregor

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films

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Silicon nitride films by reactive sputtering

Microelectronics Reliability ◽

10.1016/0026-2714(68)90175-3 ◽

1968 ◽

Vol 7 (4) ◽

pp. 340

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films

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Refractive index control of silicon nitride films prepared by radio-frequency reactive sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1513637 ◽

2002 ◽

Vol 20 (6) ◽

pp. 2137 ◽

Cited By ~ 9

Author(s):

P. S. Nayar

Keyword(s):

Refractive Index ◽

Silicon Nitride ◽

Radio Frequency ◽

Reactive Sputtering ◽

Silicon Nitride Films

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2226. Backscattering analysis of the composition o silicon-nitride films deposited by rf reactive sputtering

Vacuum ◽

10.1016/0042-207x(76)90390-0 ◽

1976 ◽

Vol 26 (10-11) ◽

pp. 498

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films ◽

Backscattering Analysis

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Backscattering analysis of the composition of silicon‐nitride films deposited by rf reactive sputtering

Journal of Applied Physics ◽

10.1063/1.322831 ◽

1976 ◽

Vol 47 (4) ◽

pp. 1302-1309 ◽

Cited By ~ 37

Author(s):

C. J. Mogab ◽

E. Lugujjo

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films ◽

Backscattering Analysis

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EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING

Applied Physics Letters ◽

10.1063/1.1754868 ◽

1967 ◽

Vol 10 (3) ◽

pp. 97-99 ◽

Cited By ~ 54

Author(s):

S. M. Hu ◽

D. R. Kerr ◽

L. V. Gregor

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Hole Injection ◽

Silicon Nitride Films

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Silicon Nitride Films Formed with DC-Magnetron Reactive Sputtering

Disorder and Order in the Solid State ◽

10.1007/978-1-4613-1027-3_17 ◽

1988 ◽

pp. 235-246

Author(s):

Napo Formigoni

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

Silicon Nitride Films ◽

Dc Magnetron Reactive Sputtering

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Deposition of Silicon Nitride Films by High Rate Reactive Sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjaps.19s1.71 ◽

1980 ◽

Vol 19 (S1) ◽

pp. 71

Author(s):

Youichi Hoshi ◽

Masahiko Naoe ◽

Shun-ichi Yamanaka

Keyword(s):

Silicon Nitride ◽

Reactive Sputtering ◽

High Rate ◽

Silicon Nitride Films

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Charging Processes in Silicon Nitride Films for RF-MEMS Capacitive Switches: The Effect of Deposition Method and Film Thickness

10.1557/proc-1139-gg03-37 ◽

2008 ◽

Cited By ~ 1

Author(s):

George Papaioannou ◽

Usama Zaghloul ◽

Robert Plana ◽

Fabio Coccetti ◽

Patrick Pons ◽

...

Keyword(s):

Silicon Nitride ◽

Film Thickness ◽

Rf Mems ◽

Deposition Method ◽

Capacitive Switches ◽

Silicon Nitride Films

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