(Invited) Structural and Electrical Characterization of TiO2 and Al-Doped TiO2 Films on Ir Electrode for Next Generation DRAM Capacitor
1993 ◽
Vol 234
(1-2)
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pp. 561-565
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2018 ◽
Vol 39
(12)
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pp. 1940-1943
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Keyword(s):
2018 ◽
Vol 44
(17)
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pp. 21114-21119
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