AlGaN/GaN Metal-Oxide-Semiconductor High Electron Mobility Transistor with Liquid Phase Deposited Al[sub 2]O[sub 3] as Gate Dielectric

2010 ◽  
Vol 157 (10) ◽  
pp. H947 ◽  
Author(s):  
Sarbani Basu ◽  
Pramod K. Singh ◽  
Po-Wen Sze ◽  
Yeong-Her Wang
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