GaN metal-oxide-semiconductor high-electron-mobility-transistor with atomic layer deposited Al2O3 as gate dielectric

2005 ◽  
Vol 86 (6) ◽  
pp. 063501 ◽  
Author(s):  
P. D. Ye ◽  
B. Yang ◽  
K. K. Ng ◽  
J. Bude ◽  
G. D. Wilk ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document