Investigation of the Thin Silicon Oxide Deposited with Different Main Gases and Gap Distances of Atmospheric-pressure Plasma Jet at Low Temperature for OTFTs Gate Insulator
2011 ◽
Vol 39
(2)
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pp. 815-821
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2015 ◽
Vol 13
(2)
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pp. 241-252
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2019 ◽
Vol 22
(2)
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pp. 025503
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2020 ◽
Vol 1697
◽
pp. 012044