Investigation of the Thin Silicon Oxide Deposited with Different Main Gases and Gap Distances of Atmospheric-pressure Plasma Jet at Low Temperature for OTFTs Gate Insulator

2019 ◽  
Vol 19 (9) ◽  
pp. 1-8
Author(s):  
Kow-Ming Chang ◽  
Shih-Syuan Huang ◽  
Je-Uai Lin ◽  
Chih-Hsiang Lin
2011 ◽  
Vol 39 (2) ◽  
pp. 815-821 ◽  
Author(s):  
Georg Daeschlein ◽  
Sebastian Scholz ◽  
Thomas von Woedtke ◽  
Maria Niggemeier ◽  
Eckhard Kindel ◽  
...  

2019 ◽  
Vol 114 (25) ◽  
pp. 254106 ◽  
Author(s):  
Wenjie Fu ◽  
Chaoyang Zhang ◽  
Cong Nie ◽  
Xiaoyun Li ◽  
Yang Yan

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