Deposition of silicon oxide coatings by atmospheric pressure plasma jet for oxygen diffusion barrier applications

2016 ◽  
Vol 615 ◽  
pp. 63-68 ◽  
Author(s):  
Haitao Zhang ◽  
Zheng Guo ◽  
Qiang Chen ◽  
Xinwei Wang ◽  
Zhengduo Wang ◽  
...  
Keyword(s):  
Diffusion Barrier ◽  
Atmospheric Pressure ◽  
Oxygen Diffusion ◽  
Silicon Oxide ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Oxide Coatings ◽  
Pressure Plasma

scholarly journals Sub-micrometer plasma-enhanced chemical vapor deposition using an atmospheric pressure plasma jet localized by a nanopipette scanning probe microscope

2021 ◽  
Author(s):  
Sho Yamamoto ◽  
Kenta Nakazawa ◽  
Akihisa Ogino ◽  
Futoshi Iwata
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Silicon Oxide ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Plasma Jet ◽  
Scanning Probe ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma

Abstract We developed a localized plasma-enhanced chemical vapor deposition (PE-CVD) technique to deposit silicon oxide with a sub-micrometer width on a substrate using an atmospheric pressure plasma jet (APPJ) irradiated from a nanopipette nozzle. To realize fine material deposition, hexamethyldisiloxane (HMDSO) vapor was blown into the localized helium APPJ irradiated from the sub-micrometer aperture of the nanpopipette with the jet length limited to the aperture size of the nanopipette. The irradiation distance was controlled using a shear-force positioning technique using scanning probe microscopy (SPM). The proposed system successfully deposited silicon oxide dots with sub-micrometer width on a substrate. After the deposition, the topography of the deposited surface was observed by scanning the nanopipette, which can be used as an SPM probe. The localized PE-CVD properties were systematically investigated by varying the deposition parameters. The amount of deposited material could be controlled by the flow rate of the carrier gas of the HMDSO vapor, APPJ irradiation time, and nanopipette–substrate surface irradiation distance.

scholarly journals High-Accuracy Surface Topography Manufacturing for Continuous Phase Plates Using an Atmospheric Pressure Plasma Jet

Micromachines ◽  
2021 ◽  
Vol 12 (6) ◽  
pp. 683
Author(s):  
Huiliang Jin ◽  
Caixue Tang ◽  
Haibo Li ◽  
Yuanhang Zhang ◽  
Yaguo Li
Keyword(s):  
Surface Topography ◽  
Atmospheric Pressure ◽  
High Efficiency ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Continuous Phase ◽  
High Accuracy ◽  
Phase Plate ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma

The continuous phase plate (CPP) is the vital diffractive optical element involved in laser beam shaping and smoothing in high-power laser systems. The high gradients, small spatial periods, and complex features make it difficult to achieve high accuracy when manufacturing such systems. A high-accuracy and high-efficiency surface topography manufacturing method for CPP is presented in this paper. The atmospheric pressure plasma jet (APPJ) system is presented and the removal characteristics are studied to obtain the optimal processing parameters. An optimized iterative algorithm based on the dwell point matrix and a fast Fourier transform (FFT) is proposed to improve the accuracy and efficiency in the dwell time calculation process. A 120 mm × 120 mm CPP surface topography with a 1326.2 nm peak-to-valley (PV) value is fabricated with four iteration steps after approximately 1.6 h of plasma processing. The residual figure error between the prescribed surface topography and plasma-processed surface topography is 28.08 nm root mean square (RMS). The far-field distribution characteristic of the plasma-fabricated surface is analyzed, for which the energy radius deviation is 11 μm at 90% encircled energy. The experimental results demonstrates the potential of the APPJ approach for the manufacturing of complex surface topographies.

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