Epitaxial Deposition of SiC onto 4H SiC using a Hollow Cathode

2019 ◽  
Vol 16 (7) ◽  
pp. 201-210 ◽  
Author(s):  
Rodney J. Soukup ◽  
Natale Ianno ◽  
James Huguenin-Love ◽  
Noel Lauer ◽  
Tino Hofmann ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Epitaxial Deposition

Epitaxial Deposition of 3C-SiC on Si Using Unconventional Sputtering of a Hollow Cathode

2010 ◽  
Vol 1246 ◽  
Author(s):  
James L Huguenin-Love ◽  
Rodney J Soukup ◽  
Natale J Ianno ◽  
Nole T Lauer
Keyword(s):  
Electron Diffraction ◽  
Hollow Cathode ◽  
High Energy ◽  
Bragg Diffraction ◽  
X Ray Diffraction ◽  
Pulsed Dc ◽  
Transmission Electron ◽  
Pole Figures ◽  
Epitaxial Deposition ◽  
Diffraction Patterns

AbstractEpitaxial 3C-SiC was grown using an unconventional technique for epitaxial growth. Thin films of 3C-SiC were deposited onto the (111) and (110) faces of Si using pulsed DC sputtering of a high purity, hollow cathode SiC target. The films were studied using x-ray diffraction (XRD), reflection high energy electron diffraction (RHEED), transmission electron microscopy (TEM), and auger electron spectroscopy (AES) techniques. XRD results presented as Bragg diffraction spectra and pole figures, and electron diffraction patterns verify crystal orientation and epitaxy. In addition, AES profiles identify the compositional integrity of the deposited films.

TEMPERATURE OF HEAVY-CURRENT CYLINDRICAL HOLLOW CATHODE

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-229-C7-230
Author(s):  
N. N. Rykalin ◽  
A. V. Nikolaev ◽  
A. P. Borzhov
Keyword(s):  
Hollow Cathode ◽  
Cylindrical Hollow Cathode

TEMPORAL BEHAVIOUR OF THE OPTOGALVANIC SIGNAL IN A HOLLOW CATHODE LAMP

1983 ◽  
Vol 44 (C7) ◽  
pp. C7-479-C7-487 ◽  
Author(s):  
M. Broglia ◽  
F. Catoni ◽  
P. Zampetti
Keyword(s):  
Hollow Cathode ◽  
Temporal Behaviour ◽  
Hollow Cathode Lamp

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Controlled gas-discharge device with cold hollow cathode

1971 ◽  
Vol 7 (3) ◽  
pp. 61 ◽  
Author(s):  
I.I. Aksenov ◽  
V.A. Belous ◽  
S.A. Smirnov
Keyword(s):  
Hollow Cathode ◽  
Gas Discharge ◽  
Discharge Device
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