Etching Characteristics and Surface Morphology of Nitrogen-Doped a-SiC Films Prepared by RF Magnetron Sputtering

2019 ◽  
Vol 14 (1) ◽  
pp. 375-384 ◽  
Author(s):  
Mariana A. Fraga ◽  
Rodrigo S. Pessoa ◽  
Ivo C. Oliveira ◽  
Marcos Massi ◽  
Homero S. Maciel ◽  
...  
2011 ◽  
Vol 679-680 ◽  
pp. 217-220 ◽  
Author(s):  
Mariana A. Fraga

This work compares the piezoresistive properties of SiC thin films produced by two techniques enhanced by plasma, PECVD (plasma enhanced chemical vapor deposition) and RF magnetron sputtering. In order to study these properties, strain gauges based on SiC films produced were fabricated using photolithography techniques in conjunction with lift-off processes. The beam-bending method was used to characterize the SiC strain gauges fabricated.


2021 ◽  
Vol 55 (1) ◽  
pp. 28-36
Author(s):  
B. Kınacı ◽  
E. Çelik ◽  
E. Çokduygulular ◽  
Ç. Çetinkaya ◽  
Y. Yalçın ◽  
...  

2013 ◽  
Vol 04 (12) ◽  
pp. 761-767 ◽  
Author(s):  
Erica Pereira da Silva ◽  
Michel Chaves ◽  
Gilvan Junior da Silva ◽  
Larissa Baldo de Arruda ◽  
Paulo Noronha Lisboa-Filho ◽  
...  

2010 ◽  
Vol 31 (5) ◽  
pp. 053004 ◽  
Author(s):  
Wang Guanghua ◽  
Kong Jincheng ◽  
Li Xiongjun ◽  
Qiu Feng ◽  
Li Cong ◽  
...  

2005 ◽  
Vol 197 (2-3) ◽  
pp. 161-167 ◽  
Author(s):  
Huidong Tang ◽  
Shouhong Tan ◽  
Zhengren Huang ◽  
Shaoming Dong ◽  
Dongliang Jiang

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