A Simple Method for Measurement of Photoacid Generator Photoreaction Kinetics in Formulated, Chemically Amplified Photoresist Films

2007 ◽  
Vol 10 (9) ◽  
pp. H273 ◽  
Author(s):  
Cheng-Tsung Lee ◽  
Wang Yueh ◽  
Jeanette Roberts ◽  
Clifford L. Henderson
Keyword(s):  
Simple Method ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator

Effect of polymer matrix and photoacid generator on the lithographic properties of chemically amplified photoresist

2014 ◽  
Vol 43 (6) ◽  
pp. 392-400 ◽  
Author(s):  
S. A. Bulgakova ◽  
D. A. Gurova ◽  
S. D. Zaitsev ◽  
E. E. Kulikov ◽  
E. V. Skorokhodov ◽  
...  
Keyword(s):  
Polymer Matrix ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator

A novel photoacid generator for chemically amplified photoresist with ArF exposure

2003 ◽  
Author(s):  
Toshikage Asakura ◽  
Hitoshi Yamato ◽  
Akira Matsumoto ◽  
Peter Murer ◽  
Masaki Ohwa
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Photoacid Generator

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

Performance of a 55-micron copper pillar bump process using a positive thick chemically amplified photoresist

2007 ◽  
Author(s):  
Dennis Crapse ◽  
Warren W. Flack ◽  
Ha-Ai Nguyen ◽  
Elliott Capsuto ◽  
Craig McEwen
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist
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