Modeling and simulations of a positive chemically amplified photoresist for x-ray lithography

1994 ◽  
Vol 12 (6) ◽  
pp. 3900 ◽  
Author(s):  
A. A. Krasnoperova
Keyword(s):  
Modeling And Simulations ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Modeling of a positive chemically amplified photoresist for x-ray lithography

1994 ◽  
Author(s):  
Azalia A. Krasnoperova ◽  
Steven J. Rhyner ◽  
Yueqi Zhu ◽  
James W. Taylor ◽  
Franco Cerrina ◽  
...  
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

1997 ◽  
Author(s):  
Azalia A. Krasnoperova ◽  
Hiroshi Ito ◽  
Gregory Breyta ◽  
Debra Fenzel-Alexander
Keyword(s):  
Comparative Study ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

Performance of a 55-micron copper pillar bump process using a positive thick chemically amplified photoresist

2007 ◽  
Author(s):  
Dennis Crapse ◽  
Warren W. Flack ◽  
Ha-Ai Nguyen ◽  
Elliott Capsuto ◽  
Craig McEwen
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Effect of surfactant-added developer on development of the chemically amplified photoresist

2000 ◽  
Author(s):  
Satoshi Kawada ◽  
Yukio Tamai ◽  
Shunkichi Omae ◽  
Tadahiro Ohmi
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist
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