Infrared Absorption Spectroscopy of Complexes in Low Carbon Concentration, Low Dose Irradiated CZ Silicon Crystal

2019 ◽  
Vol 3 (4) ◽  
pp. 313-320
Author(s):  
Naohisa Inoue ◽  
Shinya Yamazaki ◽  
Yasunori Goto ◽  
Tomoyoshi Kushida ◽  
Takahide Sugiyama
2007 ◽  
Vol 131-133 ◽  
pp. 207-212 ◽  
Author(s):  
N. Inoue ◽  
Y. Goto ◽  
T. Sugiyama

Complexes formed by low dose irradiation with electron (1015-16/cm2) and He (5x1012- 5x1013/cm2) in the relatively low carbon concentration (1016/cm3) MCZ silicon were investigated by highly sensitive and quantitative IR absorption analysis. CiOi and VO were the main complexes in all cases. The concentration of these complexes was about 1015/cm3, or 10% of included carbon in the highest case. Loss of almost equal amount of Cs was observed. The concentration of CiOiI was one order of magnitude lower. Upon annealing, these lines weakened and almost disappeared at 400 oC. There were some absorption lines introduced by the annealing. VO2 was strongest among them and CsOi related structure was also confirmed. There were absorption lines at 954.9 and 962.6 cm-1 appeared after annealing at 300 oC.


2005 ◽  
Vol 108-109 ◽  
pp. 621-626 ◽  
Author(s):  
N. Inoue ◽  
M. Nakatsu

Measurement of carbon concentration in CZ silicon by infrared absorption spectroscopy was examined. Noise level was suppressed down to 10-4 in unit of absorbance. Residual differential absorption between the sample and reference was removed by fitting the phonon absorption spectrum to the background absorption spectrum. The effect of narrowing of absorption spectral range was examined. As a result, it was possible to measure the differential carbon concentration down to about 1×1014/cm3. Measurement of commercial wafer was also established.


1999 ◽  
Author(s):  
Simon Tam ◽  
Michelle E. DeRose ◽  
Mario E. Fajardo ◽  
Norihito Sogoshi ◽  
Yoshiyasu Kato

2021 ◽  
Author(s):  
Adam J. Fleisher ◽  
Hongming Yi ◽  
Abneesh Srivastava ◽  
Oleg L. Polyansky ◽  
Nikolai F. Zobov ◽  
...  

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