Kinetics of the Low Pressure Chemical Vapor Deposition of Polycrystalline Germanium‐Silicon Alloys from SiH4 and GeH4

1993 ◽  
Vol 140 (6) ◽  
pp. 1717-1722 ◽  
Author(s):  
J. Holleman ◽  
A. E. T. Kuiper ◽  
J. F. Verweij
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Alloys ◽  
Pressure Chemical ◽  
Germanium Silicon ◽  
Kinetics Of

In Situ Phosphorus-Doped Poly-Si by Low Pressure Chemical Vapor Deposition for Passivating Contacts

2020 ◽  
Author(s):  
Meric Firat ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
Maria Recaman Payo ◽  
Filip Duerinckx ◽  
Rajiv Sharma ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Phosphorus Doped
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