Kinetics of surface reactions in very low‐pressure chemical vapor deposition of Si from SiH4

1991 ◽  
Vol 58 (25) ◽  
pp. 2963-2965 ◽  
Author(s):  
S. M. Gates ◽  
S. K. Kulkarni
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Surface Reactions ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Kinetics Of

In Situ Phosphorus-Doped Poly-Si by Low Pressure Chemical Vapor Deposition for Passivating Contacts

2020 ◽  
Author(s):  
Meric Firat ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
Maria Recaman Payo ◽  
Filip Duerinckx ◽  
Rajiv Sharma ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Phosphorus Doped
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