Evidence of Deep Energy States from Low Temperature Measurements and Its Role in Charge Trapping in Metal Gate/Hf-Silicate Gate Stacks

2019 ◽  
Vol 1 (5) ◽  
pp. 767-775 ◽  
Author(s):  
Naser A. Chowdhury ◽  
Purushothaman Srinivasan ◽  
D. Misra
Keyword(s):  
Low Temperature ◽  
Charge Trapping ◽  
Temperature Measurements ◽  
Gate Stacks ◽  
Metal Gate ◽  
Energy States

scholarly journals Charge trapping in ultrathin hafnium silicate/metal gate stacks

2005 ◽  
Vol 26 (12) ◽  
pp. 913-915 ◽  
Author(s):  
P. Srinivasan ◽  
N.A. Chowdhury ◽  
D. Misra
Keyword(s):  
Charge Trapping ◽  
Gate Stacks ◽  
Metal Gate ◽  
Hafnium Silicate

Low-Temperature Microwave Annealing for MOSFETs With High-k/Metal Gate Stacks

2013 ◽  
Vol 34 (10) ◽  
pp. 1286-1288 ◽  
Author(s):  
Yao-Jen Lee ◽  
Bo-An Tsai ◽  
Chiung-Hui Lai ◽  
Zheng-Yao Chen ◽  
Fu-Kuo Hsueh ◽  
...  
Keyword(s):  
Low Temperature ◽  
Gate Stacks ◽  
Metal Gate ◽  
Microwave Annealing ◽  
High K

Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO2 Metal Gate Stacks

2004 ◽  
Author(s):  
Takaoki SASAKI ◽  
Yasushi AKASAKA ◽  
Kazuhiro MIYAGAWA ◽  
Takeshi HOSHI ◽  
Yasuhiko WATANABE ◽  
...  
Keyword(s):  
Low Temperature ◽  
Gate Stacks ◽  
Metal Gate ◽  
Interface Characteristics

Charge trapping induced frequency-dependence degradation in n-MOSFETs with high-k/metal gate stacks

2011 ◽  
Vol 520 (5) ◽  
pp. 1511-1515 ◽  
Author(s):  
Chih-Hao Dai ◽  
Ting-Chang Chang ◽  
Ann-Kuo Chu ◽  
Yuan-Jui Kuo ◽  
Ya-Chi Hung ◽  
...  
Keyword(s):  
Frequency Dependence ◽  
Charge Trapping ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

scholarly journals High-K metal gate stacks with ultra-thin interfacial layers formed by low temperature microwave-based plasma oxidation

2017 ◽  
Vol 178 ◽  
pp. 262-265 ◽  
Author(s):  
M. Czernohorsky ◽  
K. Seidel ◽  
K. Kühnel ◽  
J. Niess ◽  
N. Sacher ◽  
...  
Keyword(s):  
Low Temperature ◽  
Plasma Oxidation ◽  
Gate Stacks ◽  
Metal Gate ◽  
Interfacial Layers ◽  
High K

scholarly journals Low Temperature Deposition of High-k/Metal Gate Stacks on High-Sn Content (Si)GeSn-Alloys

2016 ◽  
Vol 8 (20) ◽  
pp. 13133-13139 ◽  
Author(s):  
C. Schulte-Braucks ◽  
N. von den Driesch ◽  
S. Glass ◽  
A. T. Tiedemann ◽  
U. Breuer ◽  
...  
Keyword(s):  
Low Temperature ◽  
Gate Stacks ◽  
Metal Gate ◽  
Low Temperature Deposition ◽  
High K ◽  
Temperature Deposition

Interfacial layer optimization of high-k/metal gate stacks for low temperature processing

2009 ◽  
Vol 86 (7-9) ◽  
pp. 1632-1634 ◽  
Author(s):  
Barry P. Linder ◽  
Vijay Narayanan ◽  
Eduard A. Cartier
Keyword(s):  
Low Temperature ◽  
Interfacial Layer ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Low Temperature Processing
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