Growth Studies and Reaction Mechanism of the Atomic Layer Deposition of Hafnium Oxide

2019 ◽  
Vol 1 (5) ◽  
pp. 433-446 ◽  
Author(s):  
Annelies Delabie ◽  
Matty Caymax ◽  
Bert Brijs ◽  
David Brunco ◽  
Thierry Conard ◽  
...  
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...


2019 ◽  
Vol 31 (21) ◽  
pp. 8995-9002
Author(s):  
Il-Kwon Oh ◽  
Jong Seo Park ◽  
Mohammad Rizwan Khan ◽  
Kangsik Kim ◽  
Zonghoon Lee ◽  
...  

2005 ◽  
Vol 15 (4) ◽  
pp. 275-280
Author(s):  
Hie-Chul Kim ◽  
Min-Wan Kim ◽  
Hyung-Su Kim ◽  
Hyug-Jong Kim ◽  
Woo-Keun Sohn ◽  
...  

2002 ◽  
Vol 92 (10) ◽  
pp. 5698-5703 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Jonas Sundqvist ◽  
Jaan Aarik ◽  
Jun Lu ◽  
...  

2016 ◽  
Vol 16 (5) ◽  
pp. 4924-4928 ◽  
Author(s):  
Byeol Han ◽  
Yu-Jin Kim ◽  
Jae-Min Park ◽  
Luchana L Yusup ◽  
Hana Ishii ◽  
...  

2018 ◽  
Vol 6 (30) ◽  
pp. 8051-8059 ◽  
Author(s):  
Ermioni Polydorou ◽  
Martha Botzakaki ◽  
Charalampos Drivas ◽  
Kostas Seintis ◽  
Ilias Sakellis ◽  
...  

Atomic layer deposition of HfO2 significantly increases the efficiency and prolongs the lifetime of organic solar cells.


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