Microwave Plasma Etching of Si with  CF 4 and  SF 6 Gas

1982 ◽  
Vol 129 (12) ◽  
pp. 2764-2769 ◽  
Author(s):  
K. Suzuki ◽  
S. Okudaira ◽  
S. Nishimatsu ◽  
K. Usami ◽  
I. Kanomata
Keyword(s):  
Plasma Etching ◽  
Microwave Plasma

Mechanism of microwave plasma etching of polyimides in O2 and CF4 gas mixtures

1986 ◽  
Vol 5 (1-4) ◽  
pp. 375-386 ◽  
Author(s):  
N.J. Chou ◽  
J. Parazsczak ◽  
E. Babich ◽  
Y.S. Chaug ◽  
R. Goldblatt
Keyword(s):  
Plasma Etching ◽  
Microwave Plasma ◽  
Gas Mixtures

Ion energy and anisotropy in microwave plasma etching of polymers

1986 ◽  
Vol 5 (1-4) ◽  
pp. 363-374 ◽  
Author(s):  
J.E. Heidenreich ◽  
J.R. Paraszczak ◽  
M. Moisan ◽  
G. Sauve
Keyword(s):  
Plasma Etching ◽  
Microwave Plasma ◽  
Ion Energy

Microwave Plasma Etching of Silicon with CF4, F2 and SF6

1984 ◽  
Author(s):  
Ken Ninomiya ◽  
Keizo Suzuki ◽  
Shigeru Nishimatsu
Keyword(s):  
Plasma Etching ◽  
Microwave Plasma

High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields

1990 ◽  
Vol 29 (Part 1, No. 11) ◽  
pp. 2641-2643 ◽  
Author(s):  
Haruo Shindo ◽  
Tetsuro Hashimoto ◽  
Fumitake Amasaki ◽  
Yasuhiro Horiike
Keyword(s):  
Magnetic Fields ◽  
Plasma Etching ◽  
Etch Rate ◽  
Microwave Plasma ◽  
High Magnetic Fields ◽  
High Etch Rate

Role of sulfur atoms in microwave plasma etching of silicon

1987 ◽  
Vol 62 (4) ◽  
pp. 1459-1468 ◽  
Author(s):  
Ken Ninomiya ◽  
Keizo Suzuki ◽  
Shigeru Nishimatsu ◽  
Osami Okada
Keyword(s):  
Plasma Etching ◽  
Microwave Plasma
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