Thermal Oxidation of Sputtered Silicon Carbide Thin Films

1984 ◽  
Vol 131 (8) ◽  
pp. 1907-1914 ◽  
Author(s):  
W. ‐J. Lu ◽  
A. J. Steckl ◽  
T. P. Chow ◽  
W. Katz
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Thermal Oxidation

Thermodynamics and Microstructure Development in the Thin Film Reaction of Aluminum on Silicon Carbide

1995 ◽  
Vol 403 ◽  
Author(s):  
T. S. Hayes ◽  
F. T. Ray ◽  
K. P. Trumble ◽  
E. P. Kvam
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Ohmic Contacts ◽  
Microstructure Development ◽  
P Type ◽  
Microstructural Studies

AbstractA refined thernodynamic analysis of the reaction between molen Al and SiC is presented. The calculations indicate much higher Si concentrations for saturation with respect to AkC 3 formation than previously reported. Preliminary microstructural studies confirm the formation of interfacial A14C3 for pure Al thin films on SiC reacted at 9000C. The implications of the calculations and experimental observations for the production of ohmic contacts to p-type SiC are discussed.

Silicon Carbide Base Ceramic Fiber Synthesis from Polycarbosilane-Modified Polymethylsilane Blend Polymers by Melt Spinning

2011 ◽  
Vol 675-677 ◽  
pp. 139-142
Author(s):  
Xin Xing ◽  
Lin Liu ◽  
Feng Cao ◽  
Xiao Dong Li ◽  
Zeng Yong Chu ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Tensile Strength ◽  
Thermal Oxidation ◽  
Melt Spinning ◽  
Ceramic Fiber ◽  
Ceramic Yield ◽  
Base Ceramic

A melt-spinnable precursor for SiC based fibers was prepared from blend polymers of polycarbosilane (PCS) and modified polymethylsilane (M-PMS). The blend polymers cured at 320°C are different from M-PMS and PCS. The ceramic yield of these blend polymers is about 83%. The C/Si ratio of M-PMS/PCS derived ceramics (pyrolyzed at 1250°C) is linear to the content of MPMS in M-PMS/PCS. After melt spinning, thermal oxidation curing, and pyrolysis, Si-C-O fibers were obtained. The diameter and the tensile strength of the resulted fibers are 16.5μm and 1.62GPa, respectively.

Structural relaxation of amorphous silicon carbide thin films in thermal annealing

2008 ◽  
Vol 516 (12) ◽  
pp. 3855-3861 ◽  
Author(s):  
Kun Xue ◽  
Li-Sha Niu ◽  
Hui-Ji Shi ◽  
Jiwen Liu
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Structural Relaxation ◽  
Amorphous Silicon Carbide

scholarly journals Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

2015 ◽  
Vol 213 (2) ◽  
pp. 470-480 ◽  
Author(s):  
Loïc Baggetto ◽  
Cédric Charvillat ◽  
Yannick Thébault ◽  
Jérôme Esvan ◽  
Marie-Christine Lafont ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Barrier Properties ◽  
Interfacial Chemistry ◽  
Amorphous Alumina

Cuprous oxide thin films prepared by thermal oxidation of copper layer. Morphological and optical properties

2015 ◽  
Vol 159 ◽  
pp. 325-332 ◽  
Author(s):  
Artak Karapetyan ◽  
Anna Reymers ◽  
Suzanne Giorgio ◽  
Carole Fauquet ◽  
Laszlo Sajti ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Thermal Oxidation ◽  
Cuprous Oxide ◽  
Copper Layer ◽  
Oxide Thin Films

scholarly journals Synthesis and Characterization of ZnO Nanowires by Thermal Oxidation of Zn Thin Films at Various Temperatures

Molecules ◽  
2012 ◽  
Vol 17 (5) ◽  
pp. 5021-5029 ◽  
Author(s):  
Mohammad Reza Khanlary ◽  
Vahid Vahedi ◽  
Ali Reyhani
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Zno Nanowires ◽  
Synthesis And Characterization

Thermal oxidation of silicon. The special case of the growth of very thin films

1987 ◽  
Vol 55 (2) ◽  
pp. 309-309 ◽  
Author(s):  
F. Rochet ◽  
S. Rigo ◽  
M. Froment ◽  
C. d'Anterroches ◽  
C. Maillot ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Special Case
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