A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Michael E. Coltrin; Robert J. Kee; James A. Miller

doi:10.1149/1.2115598

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.2115598 ◽

1984 ◽

Vol 131 (2) ◽

pp. 425-434 ◽

Cited By ~ 276

Author(s):

Michael E. Coltrin ◽

Robert J. Kee ◽

James A. Miller

Keyword(s):

Mathematical Model ◽

Chemical Vapor Deposition ◽

Fluid Mechanics ◽

Chemical Kinetics ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.2096750 ◽

1989 ◽

Vol 136 (3) ◽

pp. 819-829 ◽

Cited By ~ 190

Author(s):

Michael E. Coltrin ◽

Robert J. Kee ◽

Greg H. Evans

Keyword(s):

Mathematical Model ◽

Chemical Vapor Deposition ◽

Fluid Mechanics ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry

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Numerical simulation of chemical kinetics in a supersonic chemical vapor deposition reactor

10.2514/6.1995-1676 ◽

1995 ◽

Cited By ~ 2

Author(s):

Christopher Moen ◽

Harry Dwyer

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Chemical Kinetics ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Cited By ~ 1

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

Thin Silicon

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The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1392026 ◽

1999 ◽

Vol 146 (8) ◽

pp. 2901-2905 ◽

Cited By ~ 4

Author(s):

B. S. MacGibbon ◽

A. A. Busnaina ◽

B. Fardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Pressure Chemical

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Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale Approach

Industrial & Engineering Chemistry Research ◽

10.1021/ie8015522 ◽

2009 ◽

Vol 48 (13) ◽

pp. 5969-5974 ◽

Cited By ~ 1

Author(s):

Yousef Sharifi ◽

Luke Achenie

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Particle Dynamics ◽

Multiscale Approach ◽

Chemical Vapor Deposition Reactor

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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Cited By ~ 4

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

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DEVELOPMENT OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF OXYGEN CONTAINING ORGANOSILAZANE POLYMER THIN FILMS

NANOCON 2019 Conference Proeedings ◽

10.37904/nanocon.2019.8749 ◽

2020 ◽

Author(s):

Roman PŘIBYL ◽

Štěpánka KELAROVÁ ◽

Vojtěch HOMOLA ◽

Vilma BURŠÍKOVÁ

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polymer Thin Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Kinetics of silicon epitaxy using SiH4in a rapid thermal chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.102719 ◽

1990 ◽

Vol 56 (7) ◽

pp. 629-631 ◽

Cited By ~ 109

Author(s):

M. Liehr ◽

C. M. Greenlief ◽

S. R. Kasi ◽

M. Offenberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Thermal Chemical Vapor Deposition ◽

Silicon Epitaxy ◽

Kinetics Of

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Temperature optimization in an azimuthally symmetric single‐wafer chemical vapor deposition reactor: The low pressure regime

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577682 ◽

1992 ◽

Vol 10 (4) ◽

pp. 843-849 ◽

Cited By ~ 1

Author(s):

David E. Kotecki ◽

Steven G. Barbee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Temperature Optimization ◽

Pressure Regime

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Study of microwave discharge at high power density conditions in diamond chemical vapor deposition reactor by optical emission spectroscopy

Diamond and Related Materials ◽

10.1016/j.diamond.2019.04.030 ◽

2019 ◽

Vol 97 ◽

pp. 107407 ◽

Cited By ~ 4

Author(s):

S.A. Bogdanov ◽

A.M. Gorbachev ◽

A.L. Vikharev ◽

D.B. Radishev ◽

M.A. Lobaev

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Microwave Discharge ◽

Chemical Vapor ◽

Optical Emission ◽

High Power Density ◽

Chemical Vapor Deposition Reactor ◽

Diamond Chemical Vapor Deposition

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