Comparison of Phosphosilicate Glass Films Deposited by Three Different Chemical Vapor Deposition Methods

Yoshimi Shioya; Mamoru Maeda

doi:10.1149/1.2109054

Comparison of Phosphosilicate Glass Films Deposited by Three Different Chemical Vapor Deposition Methods

Journal of The Electrochemical Society ◽

10.1149/1.2109054 ◽

1986 ◽

Vol 133 (9) ◽

pp. 1943-1950 ◽

Cited By ~ 27

Author(s):

Yoshimi Shioya ◽

Mamoru Maeda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Phosphosilicate Glass ◽

Glass Films

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ChemInform Abstract: Comparison of Phosphosilicate Glass Films Deposited by Three Different Chemical Vapor Deposition Methods

Chemischer Informationsdienst ◽

10.1002/chin.198651338 ◽

1986 ◽

Vol 17 (51) ◽

Author(s):

Y. SHIOYA ◽

M. MAEDA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Phosphosilicate Glass ◽

Glass Films

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Characterization of phosphosilicate glass films obtained using plasma-enhanced chemical vapor deposition from tetraethylorthosilicate and trimethylphosphite

Thin Solid Films ◽

10.1016/0040-6090(93)90684-h ◽

1993 ◽

Vol 236 (1-2) ◽

pp. 287-293 ◽

Cited By ~ 4

Author(s):

Cynthia L. Pillote ◽

Frank A. Shemansky ◽

Timothy S. Cale ◽

Gregory B. Raupp

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Phosphosilicate Glass ◽

Glass Films

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Ring resonator fabricated in phosphosilicate glass films deposited by chemical vapor deposition

Journal of Lightwave Technology ◽

10.1109/jlt.1986.1074887 ◽

1986 ◽

Vol 4 (9) ◽

pp. 1294-1303 ◽

Cited By ~ 9

Author(s):

A. Naumaan ◽

J. Boyd

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ring Resonator ◽

Chemical Vapor ◽

Phosphosilicate Glass ◽

Glass Films

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Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Borophosphosilicate Glass Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.1735 ◽

2008 ◽

Vol 47 (3) ◽

pp. 1735-1739 ◽

Cited By ~ 4

Author(s):

Minghui Yin ◽

Lingli Zhao ◽

Xiangyu Xu ◽

Shouguo Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma ◽

Borophosphosilicate Glass ◽

Glass Films

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Properties of borophosphosilicate glass films deposited by different chemical vapor deposition techniques

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586424 ◽

1992 ◽

Vol 10 (2) ◽

pp. 633 ◽

Cited By ~ 41

Author(s):

S. Rojas

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Borophosphosilicate Glass ◽

Deposition Techniques ◽

Glass Films

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Characterization of bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition silicate glass films

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1396640 ◽

2001 ◽

Vol 19 (5) ◽

pp. 1788 ◽

Cited By ~ 4

Author(s):

Byeongju Park ◽

Richard Conti ◽

Laertis Economikos ◽

Ashima Chakravarti ◽

James Ellenberger

Keyword(s):

Chemical Vapor Deposition ◽

Silicate Glass ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Glass Films

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Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean

Thin Solid Films ◽

10.1016/j.tsf.2004.06.193 ◽

2004 ◽

Vol 469-470 ◽

pp. 438-443 ◽

Cited By ~ 1

Author(s):

Jin Kun Lan ◽

Y.L. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Phosphosilicate Glass ◽

Glass Process ◽

Density Plasma

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Nanoporous Organosilicate Glass Films via Chemical Vapor Deposition onto Colloidal Crystal Templates

Plasma Processes and Polymers ◽

10.1002/ppap.200500024 ◽

2005 ◽

Vol 2 (5) ◽

pp. 401-406 ◽

Cited By ~ 12

Author(s):

Qingguo Wu ◽

April D. Ross ◽

Karen K. Gleason

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Colloidal Crystal ◽

Chemical Vapor ◽

Organosilicate Glass ◽

Glass Films

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Refractive index behavior of glass films prepared by a modified chemical vapor deposition method

Optics Communications ◽

10.1016/0030-4018(78)90304-8 ◽

1978 ◽

Vol 25 (2) ◽

pp. 193-195 ◽

Cited By ~ 1

Author(s):

Toshio Katsuyama ◽

Koji Ishida ◽

Tsuneo Suganuma

Keyword(s):

Refractive Index ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Glass Films

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00/02894 Preparation and characterization of ZrF4-BaF2-EuF3 planar glass films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Fuel and Energy Abstracts ◽

10.1016/s0140-6701(00)96807-3 ◽

2000 ◽

Vol 41 (5) ◽

pp. 319-320

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Glass Films

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