Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in  CF 4 /  H 2 Plasmas

J. L. Lindström; G. S. Oehrlein; W. A. Lanford

doi:10.1149/1.2069192

Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF 4 / H 2 Plasmas

Journal of The Electrochemical Society ◽

10.1149/1.2069192 ◽

1992 ◽

Vol 139 (1) ◽

pp. 317-320 ◽

Cited By ~ 11

Author(s):

J. L. Lindström ◽

G. S. Oehrlein ◽

W. A. Lanford

Keyword(s):

Silicon Nitride ◽

Reactive Ion Etching ◽

Ion Etching

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Reactive Ion Etching of Benzocyclobutene Using a Silicon Nitride Dielectric Etch Mask

Journal of The Electrochemical Society ◽

10.1149/1.2048721 ◽

1995 ◽

Vol 142 (9) ◽

pp. 3238-3240 ◽

Cited By ~ 23

Author(s):

Michael Schier

Keyword(s):

Silicon Nitride ◽

Reactive Ion Etching ◽

Ion Etching

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Etch mechanism in the reactive ion etching of silicon nitride

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577360 ◽

1991 ◽

Vol 9 (3) ◽

pp. 775-778 ◽

Cited By ~ 26

Author(s):

J. Dulak ◽

B. J. Howard ◽

Ch. Steinbrüchel

Keyword(s):

Silicon Nitride ◽

Reactive Ion Etching ◽

Ion Etching

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ChemInform Abstract: Reactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases.

ChemInform ◽

10.1002/chin.199025286 ◽

1990 ◽

Vol 21 (25) ◽

Author(s):

Y. KUO

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Amorphous Silicon ◽

Reactive Ion Etching ◽

Ion Etching

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Selective reactive ion etching on PECVD silicon nitride over amorphous silicon in CF4/H2 and nitrogen containing CF4/H2 plasma gas mixtures

Microelectronics Reliability ◽

10.1016/s0026-2714(97)87848-1 ◽

1997 ◽

Vol 37 (3) ◽

pp. 544-545

Keyword(s):

Silicon Nitride ◽

Amorphous Silicon ◽

Reactive Ion Etching ◽

Gas Mixtures ◽

Ion Etching

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Reactive ion etching of plasma enhanced chemical vapor deposition amorphous silicon and silicon nitride: Feeding gas effects

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576833 ◽

1990 ◽

Vol 8 (3) ◽

pp. 1702-1705 ◽

Cited By ~ 14

Author(s):

Yue Kuo

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Reactive Ion Etching ◽

Chemical Vapor ◽

Ion Etching

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Selective reactive ion etching of silicon nitride on oxide in a multifacet (‘‘HEX’’) plasma etching machine

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576243 ◽

1989 ◽

Vol 7 (3) ◽

pp. 1145-1149 ◽

Cited By ~ 4

Author(s):

Hans J. Stocker

Keyword(s):

Silicon Nitride ◽

Plasma Etching ◽

Reactive Ion Etching ◽

Ion Etching

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Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3501120 ◽

2010 ◽

Vol 28 (6) ◽

pp. 1179-1186 ◽

Cited By ~ 8

Author(s):

Peter Kaspar ◽

Yogesh Jeyaram ◽

Heinz Jäckel ◽

Annette Foelske ◽

Rüdiger Kötz ◽

...

Keyword(s):

Silicon Nitride ◽

Vertical Profile ◽

Reactive Ion Etching ◽

Etching Process ◽

Ion Etching

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Reactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases

Journal of The Electrochemical Society ◽

10.1149/1.2086638 ◽

1990 ◽

Vol 137 (4) ◽

pp. 1235-1239 ◽

Cited By ~ 20

Author(s):

Yue Kuo

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Amorphous Silicon ◽

Reactive Ion Etching ◽

Ion Etching

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Reactive Ion Etching of PECVD n+ a‐Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation

Journal of The Electrochemical Society ◽

10.1149/1.2069254 ◽

1992 ◽

Vol 139 (2) ◽

pp. 548-552 ◽

Cited By ~ 14

Author(s):

Y. Kuo ◽

M. S. Crowder

Keyword(s):

Thin Film ◽

Silicon Nitride ◽

Thin Film Transistor ◽

Reactive Ion Etching ◽

Nitride Film ◽

Silicon Nitride Film ◽

Plasma Damage ◽

Ion Etching

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Selective reactive ion etching of PECVD silicon nitride over amorphous silicon in and nitrogen containing plasma gas mixtures

Solid-State Electronics ◽

10.1016/0038-1101(95)00109-7 ◽

1996 ◽

Vol 39 (1) ◽

pp. 33-37 ◽

Cited By ~ 3

Author(s):

M.Jagadesh Kumar ◽

Savvas G. Chamberlain

Keyword(s):

Silicon Nitride ◽

Amorphous Silicon ◽

Reactive Ion Etching ◽

Gas Mixtures ◽

Ion Etching

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