Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures

2010 ◽  
Vol 28 (6) ◽  
pp. 1179-1186 ◽  
Author(s):  
Peter Kaspar ◽  
Yogesh Jeyaram ◽  
Heinz Jäckel ◽  
Annette Foelske ◽  
Rüdiger Kötz ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Vertical Profile ◽  
Reactive Ion Etching ◽  
Etching Process ◽  
Ion Etching

Modeling and simulation of the lag effect in a deep reactive ion etching process

2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li
Keyword(s):  
Modeling And Simulation ◽  
Reactive Ion Etching ◽  
Etching Process ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Lag Effect

scholarly journals Measurements of reactive ion etching process effect using long-period fiber gratings

2014 ◽  
Vol 22 (5) ◽  
pp. 5986 ◽  
Author(s):  
Mateusz Śmietana ◽  
Marcin Koba ◽  
Predrag Mikulic ◽  
Wojtek J. Bock
Keyword(s):  
Reactive Ion Etching ◽  
Etching Process ◽  
Fiber Gratings ◽  
Ion Etching ◽  
Long Period ◽  
Long Period Fiber Gratings

Etch mechanism in the reactive ion etching of silicon nitride

1991 ◽  
Vol 9 (3) ◽  
pp. 775-778 ◽  
Author(s):  
J. Dulak ◽  
B. J. Howard ◽  
Ch. Steinbrüchel
Keyword(s):  
Silicon Nitride ◽  
Reactive Ion Etching ◽  
Ion Etching

Surface smoothing of diamond membranes by reactive ion etching process

1996 ◽  
Vol 5 (6-8) ◽  
pp. 840-844 ◽  
Author(s):  
C. Vivensang ◽  
L. Ferlazzo-Manin ◽  
M.F. Ravet ◽  
G. Turban ◽  
F. Rousseaux ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Etching Process ◽  
Surface Smoothing ◽  
Ion Etching
Sign in / Sign up

Export Citation Format

Share Document