Etching of 6H‐SiC and 4H‐SiC using  NF 3 in a Reactive Ion Etching System

1996 ◽  
Vol 143 (5) ◽  
pp. 1750-1753 ◽  
Author(s):  
J. B. Casady ◽  
E. D. Luckowski ◽  
M. Bozack ◽  
D. Sheridan ◽  
R. W. Johnson ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Etching System

GaAs Taper Etching by Mixture Gas Reactive Ion Etching System

1991 ◽  
Vol 30 (Part 2, No. 12B) ◽  
pp. L2136-L2138
Author(s):  
Makoto Hirano ◽  
Kazuyoshi Asai
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Etching System

Fluorination of Graphene by Reactive Ion Etching System Using Ar/F2Plasma

2013 ◽  
Vol 52 (6S) ◽  
pp. 06GD11 ◽  
Author(s):  
Akihiro Matsutani ◽  
Kousuke Tahara ◽  
Takayuki Iwasaki ◽  
Mutsuko Hatano
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Etching System

A novel etching technology with reactive ion etching system for GaAs via-hole etching applications

2003 ◽  
Vol 16 (1) ◽  
pp. 57-59 ◽  
Author(s):  
C.S. Lin ◽  
Y.K. Fang ◽  
S.F. Ting ◽  
C.L. Wu ◽  
C.S. Chang
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Via Hole ◽  
Etching System
Sign in / Sign up

Export Citation Format

Share Document