Effects of bias frequency on reactive ion etching lag in an electron cyclotron resonance plasma etching system

1997 ◽  
Vol 15 (3) ◽  
pp. 664-667 ◽  
Author(s):  
Hyun-Ho Doh ◽  
Chung-Kyu Yeon ◽  
Ki-Woong Whang
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Reactive Ion Etching ◽  
Electron Cyclotron ◽  
Ion Etching ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma ◽  
Etching System

Mechanism of Reactive Ion Etching Lag inWSi2Etching Using Electron Cyclotron Resonance Plasma

1994 ◽  
Vol 33 (Part 1, No. 4B) ◽  
pp. 2170-2174 ◽  
Author(s):  
Takahiro Maruyama ◽  
Nobuo Fujiwara ◽  
Masahiro Yoneda ◽  
Katsuhiro Tsukamoto ◽  
Toshinobu Banjo
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Reactive Ion Etching ◽  
Electron Cyclotron ◽  
Ion Etching ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

ICl/Ar electron cyclotron resonance plasma etching of III–V nitrides

1996 ◽  
Vol 69 (10) ◽  
pp. 1426-1428 ◽  
Author(s):  
C. B. Vartuli ◽  
S. J. Pearton ◽  
J. W. Lee ◽  
J. Hong ◽  
J. D. MacKenzie ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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