Etch‐Stop Behavior of Buried Layers Formed by Substoichiometric Nitrogen Ion Implantation into Silicon
1996 ◽
Vol 143
(3)
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pp. 1026-1033
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1993 ◽
Vol 3
(3)
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pp. 143-145
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1994 ◽
Vol 66
(1-3)
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pp. 291-295
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2015 ◽
Vol 33
(6)
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pp. 629-632
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1992 ◽
Vol 43
(12)
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pp. 1103-1108
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1998 ◽
Vol 16
(2)
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pp. 477-481
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Keyword(s):
1990 ◽
Vol 16
(1-12)
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pp. 488-492
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1984 ◽
Vol 19
(11)
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pp. 1425-1431
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Keyword(s):