scholarly journals Rapid Thermal Annealing Behavior of Amorphous SiC Layers Deposited by Electron Cyclotron Resonance Plasma

1996 ◽  
Vol 143 (1) ◽  
pp. 271-277 ◽  
Author(s):  
F. J. Gomez ◽  
J. Garrido ◽  
J. Martinez ◽  
J. Piqueras
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Annealing Behavior ◽  
Amorphous Sic ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
Sign in / Sign up

Export Citation Format

Share Document