Scale-up of a Parallel Plate RF Plasma Etching Reactor by Using Reactive Gas Flow Simulations

2001 ◽  
Vol 148 (8) ◽  
pp. G456 ◽  
Author(s):  
Masato Ikegawa ◽  
Takahiro Tamai ◽  
Koyo Morita ◽  
Kenji Maeda
Keyword(s):  
Plasma Etching ◽  
Parallel Plate ◽  
Gas Flow ◽  
Scale Up ◽  
Rf Plasma ◽  
Flow Simulations ◽  
Reactive Gas

CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP

1991 ◽  
Vol 223 ◽  
Author(s):  
Victor. J. Law ◽  
S. G. Ingram ◽  
G. A. C. Jones ◽  
R. C. Grimwood ◽  
H. Royal
Keyword(s):  
Plasma Etching ◽  
Gas Flow ◽  
Electron Cyclotron Resonance ◽  
Kinetic Studies ◽  
High Electron Mobility Transistor ◽  
Rf Plasma ◽  
High Electron ◽  
Ecr Plasma ◽  
Etch Rates ◽  
Ecr Plasma Etching

ABSTRACTA comparative study of CH4 :H2 , and CH4 :H2 :Ar rf-plasma and microwave electron cyclotron resonance (ECR) plasma etching of GaAs and InP is presented. The study is in two parts;(i) Kinetic studies of GaAs and InP etch rates as a function of the constituent gas flow rates, applied rf and microwave powers, substrate temperature and position. The results indicate that CH4 :H2 :Ar ECR etching of GaAs is 10× more efficient in the utilisation of the CH4 precursor gas than rf-plasmas. However, the absolute etch rates are lower (70 nm min−1 for rf and 25 nm min−1 for rf biassed ECR-plasmas).The effect of etching conditions on InP morphology is also examined.(ii) The study of electrical “damage” in GaAs/AlGaAs high electron mobility transistor (HEMT) Hall bar structures, was investigated by ECR-plasma etching off the top GaAs capping layer. Results indicate that ECR-plasma etching with an rf-bias between 0V and −30V does not significantly effect the electrical characteristics of such devices at 300K, with some degredation at 1.2 K.

Two-dimensional model of reactive gas flow in a diamond film CVD reactor

1995 ◽  
Vol 4 (8) ◽  
pp. 1065-1068 ◽  
Author(s):  
Y.A. Mankelevich ◽  
A.T. Rakhimov ◽  
N.V. Suetin
Keyword(s):  
Diamond Film ◽  
Gas Flow ◽  
Two Dimensional ◽  
Dimensional Model ◽  
Two Dimensional Model ◽  
Reactive Gas

Investigation Techniques of In Situ AlMg/AlN Metal Matrix Composites via Reactive Gas Injection

2013 ◽  
Vol 837 ◽  
pp. 283-289 ◽  
Author(s):  
Raluca Maria Florea ◽  
Oana Bălţătescu ◽  
Aurelian Buzăianu ◽  
Ioan Carcea
Keyword(s):  
Metal Matrix ◽  
Gas Flow ◽  
Sem Analysis ◽  
Critical Parameters ◽  
Matrix Composites ◽  
Uniform Dispersion ◽  
Liquid Systems ◽  
Spontaneous Infiltration ◽  
Reactive Gas

In this paper characteristics of an AlMg/AlN composite produced in-situ and processed in a flowing N2 atmosphere is investigated. Some critical parameters such as the manufacturing process temperature, the percentage of the magnesium consumed, the flowing reactive gas flow and the time for completing the manufacturing are considered as variables for the parametric investigation. Moreover, the effect of different amount of Mg employed has been also investigated, since Mg acts as a catalyst at the surface both for the gas/liquid and solid/liquid systems. Traditional methods were used for the basic characterization of the composite. The microstructure of the composite was investigated by optical and scanning electron microscopy (OM, SEM). SEM analysis was performed in order to observe the microstructural evolution as a function of the Mg content and to identify some reasons of the presence of porosity or any irregularities within the metal matrix. The evolution of mechanical properties, in terms of microhardness, at different percentage of Mg were monitored. By EDS technique the distribution of the elements was obtained. Furthermore, employing an optimization process, uniform dispersion of the strengthening (AlN) particles in the metal matrix with homogeneous properties along the composite material is obtained. Based on the aforementioned statements, it can be concluded that the reactions between Al, Mg and the N2 atmosphere induce spontaneous infiltration in the metal matrix. The complete mix of properties and experimentally assessed parameters can be used for industrial purpose manufacturing design and development.

scholarly journals Dynamically structured bubbling in vibrated gas-fluidized granular materials

2021 ◽  
Vol 118 (35) ◽  
pp. e2108647118
Author(s):  
Qiang Guo ◽  
Yuxuan Zhang ◽  
Azin Padash ◽  
Kenan Xi ◽  
Thomas M. Kovar ◽  
...  
Keyword(s):  
Resonant Frequency ◽  
Granular Materials ◽  
Fluidized Beds ◽  
Gas Flow ◽  
Scale Up ◽  
Clean Energy ◽  
System Size ◽  
Optimal Operation ◽  
Constitutive Relationship ◽  
Energy Processes

The dynamics of granular materials are critical to many natural and industrial processes; granular motion is often strikingly similar to flow in conventional liquids. Food, pharmaceutical, and clean energy processes utilize bubbling fluidized beds, systems in which gas is flowed upward through granular particles, suspending the particles in a liquid-like state through which gas voids or bubbles rise. Here, we demonstrate that vibrating these systems at a resonant frequency can transform the normally chaotic motion of these bubbles into a dynamically structured configuration, creating reproducible, controlled motion of particles and gas. The resonant frequency is independent of particle properties and system size, and a simple harmonic oscillator model captures this frequency. Discrete particle simulations show that bubble structuring forms because of rapid, local transitions between solid-like and fluid-like behavior in the grains induced by vibration. Existing continuum models for gas–solid flows struggle to capture these fluid–solid transitions and thus cannot predict the bubble structuring. We propose a constitutive relationship for solids stress that predicts fluid–solid transitions and hence captures the experimental structured bubbling patterns. Similar structuring has been observed by oscillating gas flow in bubbling fluidized beds. We show that vibrating bubbling fluidized beds can produce a more ordered structure, particularly as system size is increased. The scalable structure and continuum model proposed here provide the potential to address major issues with scale-up and optimal operation, which currently limit the use of bubbling fluidized beds in existing and emerging technologies.

scholarly journals CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

2018 ◽  
Vol 435 ◽  
pp. 31-38 ◽  
Author(s):  
János Szívós ◽  
Szilárd Pothorszky ◽  
Jan Soltys ◽  
Miklós Serényi ◽  
Hongyu An ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Rf Plasma ◽  
Magnetic Media ◽  
Tin Films
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