Etch Characteristics of Cr by Using Cl[sub 2]/O[sub 2] Gas Mixtures with Electron Cyclotron Resonance Plasma

2001 ◽  
Vol 148 (5) ◽  
pp. G237 ◽  
Author(s):  
Seung-Youl Kang ◽  
Kwang-Ho Kwon ◽  
Sung-Ihl Kim ◽  
Sang-Kyun Lee ◽  
Moon-Youn Jung ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Gas Mixtures ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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