Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent

2001 ◽  
Vol 4 (4) ◽  
pp. C17 ◽  
Author(s):  
Jin-Seong Park ◽  
Min-Jung Lee ◽  
Choon-Soo Lee ◽  
Sang-Won Kang
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition ◽  
Tantalum Nitrides ◽  
Hydrogen Radicals

Atomic Layer Deposition of Ta(Al)N(C) Thin Films Using Trimethylaluminum as a Reducing Agent

2001 ◽  
Vol 148 (10) ◽  
pp. G566 ◽  
Author(s):  
Petra Alén ◽  
Marika Juppo ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Juhani Keinonen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition

Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agent

2016 ◽  
Vol 379 ◽  
pp. 523-529 ◽  
Author(s):  
Mouhamadou Sarr ◽  
Naoufal Bahlawane ◽  
Didier Arl ◽  
Manuel Dossot ◽  
Edward McRae ◽  
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Keyword(s):  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition ◽  
Cobalt Carbide

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition
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