Thermal atomic layer deposition of Sn metal using SnCl4 and a vapor phase silyl dihydropyrazine reducing agent

2018 ◽  
Vol 36 (6) ◽  
pp. 06A106
Author(s):  
Eric C. Stevens ◽  
Moataz Bellah M. Mousa ◽  
Gregory N. Parsons
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition

Atomic Layer Deposition of Ta(Al)N(C) Thin Films Using Trimethylaluminum as a Reducing Agent

2001 ◽  
Vol 148 (10) ◽  
pp. G566 ◽  
Author(s):  
Petra Alén ◽  
Marika Juppo ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Juhani Keinonen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition

Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agent

2016 ◽  
Vol 379 ◽  
pp. 523-529 ◽  
Author(s):  
Mouhamadou Sarr ◽  
Naoufal Bahlawane ◽  
Didier Arl ◽  
Manuel Dossot ◽  
Edward McRae ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Reducing Agent ◽  
Layer Deposition ◽  
Cobalt Carbide

scholarly journals Combining nanoparticles grown by ALD and MOFs for gas separation and catalysis applications

2020 ◽  
Vol 92 (2) ◽  
pp. 213-222 ◽  
Author(s):  
Matthieu Weber ◽  
Mikhael Bechelany
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gas Separation ◽  
Vapor Phase ◽  
Metallic Nanoparticles ◽  
Metal Organic Frameworks ◽  
Atomic Layer ◽  
Chemical Processes ◽  
Layer Deposition ◽  
Metal Organic

AbstractSupported metallic nanoparticles (NPs) are essential for many important chemical processes. In order to implement precisely tuned NPs in miniaturized devices by compatible processes, novel nanoengineering routes must be explored. Atomic layer deposition (ALD), a scalable vapor phase technology typically used for the deposition of thin films, represents a promising new route for the synthesis of supported metallic NPs. Metal–organic frameworks (MOFs) are a new exciting class of crystalline porous materials that have attracted much attention in the recent years. Since the size of their pores can be precisely adjusted, these nanomaterials permit highly selective separation and catalytic processes. The combination of NPs and MOF is an emerging area opening numbers of applications, which still faces considerable challenges, and new routes need to be explored for the synthesis of these NPs/MOF nanocomposites. The aim of this paper is double: first, it aims to briefly present the ALD route and its use for the synthesis of metallic NPs. Second, the combination of ALD-grown NPs and MOFs has been explored for the synthesis of Pd NPs/MOF ZIF-8, and several selected examples were ALD-grown NPs and MOFs have been combined and applied gas separation and catalysis will be presented.

scholarly journals Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition

JOM ◽  
2018 ◽  
Vol 71 (1) ◽  
pp. 185-196 ◽  
Author(s):  
Ashwanth Subramanian ◽  
Nikhil Tiwale ◽  
Chang-Yong Nam
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Atomic Layer ◽  
Recent Advances ◽  
Layer Deposition

Vapor-Phase Metalation by Atomic Layer Deposition in a Metal–Organic Framework

2013 ◽  
Vol 135 (28) ◽  
pp. 10294-10297 ◽  
Author(s):  
Joseph E. Mondloch ◽  
Wojciech Bury ◽  
David Fairen-Jimenez ◽  
Stephanie Kwon ◽  
Erica J. DeMarco ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

Vapor-Phase Grafting of Functional Silanes to Al2O3, ZnO, and TiO2 Surfaces Prepared By Atomic Layer Deposition

2021 ◽  
Vol MA2021-02 (29) ◽  
pp. 881-881
Author(s):  
Vepa Rozyyev ◽  
Jeffrey W. Elam ◽  
Anil U. Mane ◽  
Julia G. Murphy ◽  
Edward F. Barry ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Atomic Layer ◽  
Layer Deposition
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