(Invited) Metal-Insulator-Metal Devices with High-K Dielectric for Nonvolatile or Dynamic Random Access Memories

A. Bsiesy; P. Gonon; C. Vallee; J. Pointet; C. Mannequin

doi:10.1149/06701.0099ecst

(Invited) Metal-Insulator-Metal Devices with High-K Dielectric for Nonvolatile or Dynamic Random Access Memories

ECS Transactions ◽

10.1149/06701.0099ecst ◽

2015 ◽

Vol 67 (1) ◽

pp. 99-110 ◽

Cited By ~ 2

Author(s):

A. Bsiesy ◽

P. Gonon ◽

C. Vallee ◽

J. Pointet ◽

C. Mannequin

Keyword(s):

Random Access ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

High K Dielectric

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Time dependent dielectric breakdown of amorphous ZrAlxOy high-k dielectric used in dynamic random access memory metal-insulator-metal capacitor

Journal of Applied Physics ◽

10.1063/1.3204001 ◽

2009 ◽

Vol 106 (4) ◽

pp. 044104 ◽

Cited By ~ 13

Author(s):

Dayu Zhou ◽

U. Schroeder ◽

G. Jegert ◽

M. Kerber ◽

S. Uppal ◽

...

Keyword(s):

Dielectric Breakdown ◽

Random Access ◽

Random Access Memory ◽

Time Dependent ◽

Access Memory ◽

Metal Insulator ◽

Time Dependent Dielectric Breakdown ◽

High K ◽

Metal Insulator Metal ◽

High K Dielectric

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Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications

Thin Solid Films ◽

10.1016/j.tsf.2013.03.045 ◽

2013 ◽

Vol 536 ◽

pp. 68-73 ◽

Cited By ~ 3

Author(s):

A. Abrutis ◽

M. Lukosius ◽

M. Skapas ◽

S. Stanionyte ◽

V. Kubilius ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

Metal Organic ◽

Organic Precursors ◽

High K Dielectric ◽

Organic Chemical Vapor Deposition

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WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

Thin Solid Films ◽

10.1016/j.tsf.2009.12.008 ◽

2009 ◽

Author(s):

Rakesh Sohal ◽

Grzegorz Lupina ◽

Peter Zaumseil ◽

Thomas Schroeder

Keyword(s):

Thin Films ◽

Metal Insulator ◽

Dielectric Thin Films ◽

High K ◽

Metal Insulator Metal ◽

Device Applications ◽

High K Dielectric

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An Extended Unified Schottky-Poole-Frenkel Theory to Explain the Current-Voltage Characteristics of Thin Film Metal-Insulator-Metal Capacitors with Examples for Various High-k Dielectric Materials

ECS Journal of Solid State Science and Technology ◽

10.1149/2.006301jss ◽

2012 ◽

Vol 1 (6) ◽

pp. N139-N148 ◽

Cited By ~ 19

Author(s):

W. S. Lau

Keyword(s):

Thin Film ◽

Dielectric Materials ◽

Metal Insulator ◽

High K ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics ◽

High K Dielectric

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Effect of Interface Treatment on the Voltage Linearity in 8 fF/μm2 High-k Dielectric and Combination Stacks on Metal Insulator Metal (MIM) Capacitor

Science of Advanced Materials ◽

10.1166/sam.2018.3044 ◽

2017 ◽

Vol 10 (4) ◽

pp. 467-470

Author(s):

Eunmi Choi ◽

Areum Kim ◽

Soon Hyeong Kwon ◽

Sung Gyu Pyo

Keyword(s):

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

High K Dielectric ◽

Interface Treatment

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Advanced high-k dielectric amorphous LaGdO3 based high density metal-insulator-metal capacitors with sub-nanometer capacitance equivalent thickness

Applied Physics Letters ◽

10.1063/1.4812670 ◽

2013 ◽

Vol 102 (25) ◽

pp. 252905 ◽

Cited By ~ 11

Author(s):

S. P. Pavunny ◽

P. Misra ◽

J. F. Scott ◽

R. S. Katiyar

Keyword(s):

High Density ◽

Equivalent Thickness ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

High K Dielectric

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Microstructure and chemical analysis of Hf-based high-k dielectric layers in metal–insulator–metal capacitors

Thin Solid Films ◽

10.1016/j.tsf.2010.03.002 ◽

2010 ◽

Vol 518 (15) ◽

pp. 4467-4472 ◽

Cited By ~ 2

Author(s):

P. Thangadurai ◽

V. Mikhelashvili ◽

G. Eisenstein ◽

W.D. Kaplan

Keyword(s):

Chemical Analysis ◽

Metal Insulator ◽

Dielectric Layers ◽

High K ◽

Metal Insulator Metal ◽

High K Dielectric

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A Substitution for the High- k Dielectric in an AlGaN/GaN Metal-insulator-Semiconductor Heterostructure

Chinese Physics Letters ◽

10.1088/0256-307x/29/5/057702 ◽

2012 ◽

Vol 29 (5) ◽

pp. 057702 ◽

Cited By ~ 1

Author(s):

Yue-Chan Kong ◽

Fang-Shi Xue ◽

Jian-Jun Zhou ◽

Liang Li ◽

Chen Chen ◽

...

Keyword(s):

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Heterostructure ◽

High K ◽

High K Dielectric

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An amorphous titanium dioxide metal insulator metal selector device for resistive random access memory crossbar arrays with tunable voltage margin

Applied Physics Letters ◽

10.1063/1.4940361 ◽

2016 ◽

Vol 108 (3) ◽

pp. 033505 ◽

Cited By ~ 14

Author(s):

Simone Cortese ◽

Ali Khiat ◽

Daniela Carta ◽

Mark E. Light ◽

Themistoklis Prodromakis

Keyword(s):

Titanium Dioxide ◽

Random Access ◽

Random Access Memory ◽

Resistive Random Access Memory ◽

Access Memory ◽

Metal Insulator ◽

Metal Insulator Metal

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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