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Characterization of Random Telegraph Noise in Scaled High- /Metal-Gate MOSFETs with SiO2/HfO2 Gate Dielectrics
ECS Transactions
◽
10.1149/05201.0941ecst
◽
2013
◽
Vol 52
(1)
◽
pp. 941-946
◽
Cited By ~ 4
Author(s):
M. Li
◽
R. Wang
◽
J. Zou
◽
R. Huang
Keyword(s):
Gate Dielectrics
◽
Metal Gate
◽
Random Telegraph Noise
◽
Telegraph Noise
◽
High Metal
Download Full-text
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References
Defect properties of high-k/metal-gate metal–oxide–semiconductor field-effect transistors determined by characterization of random telegraph noise
Japanese Journal of Applied Physics
◽
10.7567/jjap.53.038005
◽
2014
◽
Vol 53
(3)
◽
pp. 038005
Author(s):
San-Lein Wu
◽
Hsu-Feng Chiu
◽
Yee-Shyi Chang
◽
Osbert Cheng
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Random Telegraph Noise
◽
High K
◽
Telegraph Noise
Download Full-text
Characterization of Random Telegraph Noise Generated by Process- and Cycling-Stress-Induced Traps in 26 nm NAND Flash Memory
Japanese Journal of Applied Physics
◽
10.7567/jjap.52.04ca07
◽
2013
◽
Vol 52
(4S)
◽
pp. 04CA07
◽
Cited By ~ 2
Author(s):
Bong-Su Jo
◽
Ho-Jung Kang
◽
Sung-Min Joe
◽
Min-Kyu Jeong
◽
Kyung-Rok Han
◽
...
Keyword(s):
Flash Memory
◽
Nand Flash
◽
Nand Flash Memory
◽
Random Telegraph Noise
◽
Telegraph Noise
Download Full-text
Transistor-level characterization of static random access memory bit failures induced by random telegraph noise
Japanese Journal of Applied Physics
◽
10.7567/jjap.55.04ed05
◽
2016
◽
Vol 55
(4S)
◽
pp. 04ED05
◽
Cited By ~ 2
Author(s):
Tomoko Mizutani
◽
Takuya Saraya
◽
Kiyoshi Takeuchi
◽
Masaharu Kobayashi
◽
Toshiro Hiramoto
Keyword(s):
Random Access
◽
Random Access Memory
◽
Static Random Access Memory
◽
Access Memory
◽
Random Telegraph Noise
◽
Telegraph Noise
Download Full-text
Characterization of Four-Level Random Telegraph Noise in a Gate-All-Around Poly-Si Nanowire Transistor
2019 Silicon Nanoelectronics Workshop (SNW)
◽
10.23919/snw.2019.8782974
◽
2019
◽
Cited By ~ 1
Author(s):
You-Tai Chang
◽
Pei-Wen Li
◽
Horng-Chih Lin
Keyword(s):
Random Telegraph Noise
◽
Si Nanowire
◽
Nanowire Transistor
◽
Telegraph Noise
Download Full-text
Characterization of random telegraph noise and its impact on reliability of SRAM sense amplifiers
2014 5th European Workshop on CMOS Variability (VARI)
◽
10.1109/vari.2014.6957088
◽
2014
◽
Cited By ~ 6
Author(s):
J. Martin-Martinez
◽
J. Diaz
◽
R. Rodriguez
◽
M. Nafria
◽
X. Aymerich
◽
...
Keyword(s):
Random Telegraph Noise
◽
Telegraph Noise
◽
Sense Amplifiers
Download Full-text
Characterization of Oxide Traps in 28 nm nMOSFETs with Different Uniaxial Tensile Stress by Utilizing Random Telegraph Noise (RTN)
10.7567/ssdm.2012.ps-3-25
◽
2012
◽
Author(s):
B. C. Wang
◽
S. L. Wu
◽
C. Y. Wu
◽
C. W. Huang
◽
T. Y. Lu
◽
...
Keyword(s):
Tensile Stress
◽
Uniaxial Tensile
◽
Random Telegraph Noise
◽
Telegraph Noise
◽
Uniaxial Tensile Stress
◽
Oxide Traps
◽
28 Nm
Download Full-text
Impact of Trap Behavior on Random Telegraph Noise in High-k/Metal Gate pMOSFETs
Journal of Nanoelectronics and Optoelectronics
◽
10.1166/jno.2018.2128
◽
2018
◽
Vol 13
(4)
◽
pp. 454-457
Author(s):
Tsung-Hsien Kao
◽
Sheng-Po Chang
◽
Shoou-Jinn Chang
Keyword(s):
Metal Gate
◽
Random Telegraph Noise
◽
High K
◽
Telegraph Noise
Download Full-text
Dedicated random telegraph noise characterization of Ni/HfO2-based RRAM devices
Microelectronic Engineering
◽
10.1016/j.mee.2015.04.046
◽
2015
◽
Vol 147
◽
pp. 59-62
◽
Cited By ~ 5
Author(s):
M.B. Gonzalez
◽
J. Martin-Martinez
◽
R. Rodriguez
◽
M.C. Acero
◽
M. Nafria
◽
...
Keyword(s):
Random Telegraph Noise
◽
Telegraph Noise
◽
Noise Characterization
Download Full-text
Investigation of trap properties in high-k/metal gate p-type metal-oxide-semiconductor field-effect-transistors with aluminum ion implantation using random telegraph noise analysis
Applied Physics Letters
◽
10.1063/1.4893445
◽
2014
◽
Vol 105
(6)
◽
pp. 062109
Author(s):
Tsung-Hsien Kao
◽
Shoou-Jinn Chang
◽
Yean-Kuen Fang
◽
Po-Chin Huang
◽
Chien-Ming Lai
◽
...
Keyword(s):
Field Effect
◽
Field Effect Transistors
◽
Noise Analysis
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Random Telegraph Noise
◽
High K
◽
Telegraph Noise
◽
P Type
Download Full-text
Characterization of CF4-plasma fluorinated HfO2 gate dielectrics with TaN metal gate
Applied Physics Letters
◽
10.1063/1.1944230
◽
2005
◽
Vol 86
(22)
◽
pp. 222905
◽
Cited By ~ 27
Author(s):
Chao Sung Lai
◽
Woei Cherng Wu
◽
Jer Chyi Wang
◽
Tien sheng Chao
Keyword(s):
Gate Dielectrics
◽
Metal Gate
Download Full-text
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