Electrical Resistance of Gold Films Deposited onto Substrate Agitated by Ultrasonic Vibration

1970 ◽  
Vol 9 (1) ◽  
pp. 154-155 ◽  
Author(s):  
Kiyohiko Uozumi
Keyword(s):  
Ultrasonic Vibration ◽  
Electrical Resistance ◽  
Gold Films

Electrical Resistance of Thin Triode‐Sputtered Gold Films

1968 ◽  
Vol 39 (6) ◽  
pp. 2948-2953 ◽  
Author(s):  
P. A. B. Toombs ◽  
P. Bennett
Keyword(s):  
Electrical Resistance ◽  
Gold Films

Stretchable conductors: thin gold films on silicone elastomer

2003 ◽  
Vol 795 ◽  
Author(s):  
Stéphanie P. Lacour ◽  
Sigurd Wagner ◽  
Z. Suo
Keyword(s):  
Electrical Resistance ◽  
Tensile Strain ◽  
Scale Structure ◽  
Gold Layer ◽  
Silicone Elastomer ◽  
Gold Films ◽  
Electrically Conducting ◽  
Electrical Interconnects ◽  
Stretchable Conductors ◽  
Micrometer Scale

ABSTRACTThin stripes of gold deposited onto elastomeric substrates can be stretched reversibly by more than 20 % while remaining electrically conducting. We are developing such stripes to serve as electrical interconnects on stretchable electronic skins. The gold layers are 25-nm to 500-nm thick. We observe two different film morphologies: the stripe is either buckled and continuous, or flat and contains micrometer-long cracks. Stretchability is correlated with the thickness and initial topography of the gold layer. Stripes thicker than 100-nm fail electrically at tensile strain of ∼ 1 %, while thinner stripes remain conducting up to much larger strain. Upon stretching the buckled stripes flatten and break into islands of 1 to 100 micrometers on a side, while the initially microcracked stripes retain their micrometer scale structure. The electrical resistance of the buckled stripes is the lowest but the micro-textured stripes can be stretched more.

The Decay in Electrical Resistance in Evaporated Gold Films

1965 ◽  
Vol 4 (3) ◽  
pp. 161-164 ◽  
Author(s):  
Akira Kinbara ◽  
Yuji Sawatari
Keyword(s):  
Electrical Resistance ◽  
Gold Films

Influence of grain boundaries and surface Debye temperature on the electrical resistance of thin gold films

1984 ◽  
Vol 29 (2) ◽  
pp. 645-650 ◽  
Author(s):  
P. M. Th. M. van Attekum ◽  
P. H. Woerlee ◽  
G. C. Verkade ◽  
A. A. M. Hoeben
Keyword(s):  
Grain Boundaries ◽  
Debye Temperature ◽  
Electrical Resistance ◽  
Gold Films

Effects of temperature and tensile strain on the electrical resistance of nanometric gold films

2019 ◽  
Vol 6 (6) ◽  
pp. 066407 ◽  
Author(s):  
A I Oliva ◽  
L Ruiz-Tabasco ◽  
J Ojeda-García ◽  
J E Corona ◽  
V Sosa ◽  
...  
Keyword(s):  
Electrical Resistance ◽  
Tensile Strain ◽  
Gold Films ◽  
Effects Of Temperature

Electrical Characterization of Traditional and Aerosol Jet Printed Conductors Under Tensile Strain

MRS Advances ◽  
2016 ◽  
Vol 1 (1) ◽  
pp. 15-20 ◽  
Author(s):  
Jake Rabinowitz ◽  
Gregory Fritz ◽  
Parshant Kumar ◽  
Peter Lewis ◽  
Mikel Miller ◽  
...  
Keyword(s):  
Electrical Resistance ◽  
Tensile Strain ◽  
Electrical Characterization ◽  
Gold Films ◽  
Silver Films ◽  
Polymer Systems ◽  
Resistance Increase ◽  
Strain Discontinuity ◽  
Metal Polymer

ABSTRACTIn this work, we propose a model to quantify strain induced conductor discontinuities based on measuring electrical resistance while applying tensile strain to metal-polymer systems. Under strain, changing conductor geometry and induced conductor discontinuity increase electrical resistance. On Kapton substrates strained to ε = .07, evaporated gold films did not deform and resistance increase was only caused by geometry change. Conversely, discontinuity caused 31% and 72% of the resistance increase in evaporated and printed silver films at the same strain. On PDMS substrates, the same magnitude of discontinuity, causing 31% of the resistance increase, occurred at only ε = .024 in evaporated silver films. At the same strain, discontinuity caused 86% of the resistance increase in evaporated gold films. Printed silver films were inelastic. The results suggest that traditional fabrication techniques may be more suitable to flexible hybrid electronics applications than additively manufactured conductors.

ELASTOMERIC INTERCONNECTS

2006 ◽  
Vol 16 (01) ◽  
pp. 397-407 ◽  
Author(s):  
Stéphanie P. Lacour ◽  
Joyelle Jones ◽  
Sigurd Wagner ◽  
Teng Li ◽  
Z. Suo
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Electrical Resistance ◽  
Thin Film Transistors ◽  
Thin Film Transistor ◽  
Gold Films ◽  
Silicon Thin Film ◽  
Electrical Failure ◽  
Electrically Conducting ◽  
Silicone Membranes

Elastomeric interconnects made of patterned thin gold films on silicone membranes, can be reversibly bent, uniaxially or radially stretched while remaining electrically conducting. Such interconnects can be stretched to double their length, cycled 1,000 times without electrical failure. While the electrical resistance may increase threefold upon stretching, the resistance values still remain ~1,000 times below the typical input impedance of amorphous silicon thin film transistors. Therefore the stretchable gold films can function as interconnects for power and signal to a fully elastic thin film transistor inverter.

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