Measurement of Potential Distribution in a Semiconductor Crystal with an Electron Beam

1967 ◽  
Vol 6 (4) ◽  
pp. 548-549 ◽  
Author(s):  
Chusuke Munakata
Keyword(s):  
Electron Beam ◽  
Potential Distribution ◽  
Semiconductor Crystal

V-Shaped Potential Distribution with a Virtual Cathode Generated by an Electron Beam Injection

1982 ◽  
Vol 51 (2) ◽  
pp. 650-657 ◽  
Author(s):  
Hiroharu Fujita ◽  
Shinya Yagura ◽  
Eiichi Yamada ◽  
Akira Aoyagi
Keyword(s):  
Electron Beam ◽  
Potential Distribution ◽  
Virtual Cathode ◽  
Beam Injection

Characteristics of the foil lens for the correction of the spherical aberration and its application to STEM

1978 ◽  
Vol 36 (1) ◽  
pp. 38-39
Author(s):  
M. Hibino ◽  
M. Kuzuya ◽  
T. Hanai ◽  
S. Maruse
Keyword(s):  
Electron Beam ◽  
Potential Distribution ◽  
Spherical Aberration ◽  
Magnetic Lens ◽  
Aperture Diaphragm ◽  
Concave Lens ◽  
Thin Conducting

There have been a number of methods proposed and investigated for the correction of the spherical aberration, since this aberration is one of the most important factors which limit the performance of various kinds of electron beam instruments. A foil lens has been investigated preliminarily and the possibility of correcting the spherical aberration of a conventional magnetic lens with reasonable ease has been shown for the first time.The foil lens studied consists of an aperture diaphragm and a thin conducting foil fundamentally as is shown in Fig. 1, and is simple enough in design and adjustment. When the voltage is applied between the diaphragm and the foil, the curved potential distribution is produced around the aperture and the foil lens acts as a concave or negative lens. This concave lens produces the negative spherical aberration and can be utilized to correct the positive spherical aberration of the conventional magnetic lens.

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