Thin-Film Deposition of Metal Oxides by Aerosol-Assisted Chemical Vapour Deposition: Evaluation of Film Crystallinity

2007 ◽  
Vol 46 (12) ◽  
pp. 7852-7854 ◽  
Author(s):  
Masahiro Takeuchi ◽  
Kunisuke Maki
Keyword(s):  
Thin Film ◽  
Metal Oxides ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Film Deposition

scholarly journals Thin film Deposition Methods: A Critical Review

2021 ◽  
Vol 9 (VI) ◽  
pp. 5215-5232
Author(s):  
Mandakini N. Chaudhari
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Vapour Deposition ◽  
Research Work ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Specific Method ◽  
Important Method ◽  
Advantages And Disadvantages

The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.

scholarly journals Cobalt and manganese carboxylates for metal oxide thin film deposition by applying the atmospheric pressure combustion chemical vapour deposition process

RSC Advances ◽  
2018 ◽  
Vol 8 (28) ◽  
pp. 15632-15640 ◽  
Author(s):  
B. S. M. Kretzschmar ◽  
K. Assim ◽  
A. Preuß ◽  
A. Heft ◽  
M. Korb ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

Complexes [M(O2CCH2OC2H4OMe)2] (M = Co, Mn) were synthesized characterised regarding their thermal behaviour. They were used as precursors for deposition of rough Co3O4and smooth Mn2O3/Mn3O4thin filmsviathe CCVD process.

Oxidative chemical vapour deposition of a graphene oxide carbocatalyst on 3D nickel foam as a collaborative electrocatalyst towards the hydrogen evolution reaction in acidic electrolyte

2018 ◽  
Vol 2 (6) ◽  
pp. 1305-1311 ◽  
Author(s):  
Sangchai Sarawutanukul ◽  
Nutthaphon Phattharasupakun ◽  
Juthaporn Wutthiprom ◽  
Montree Sawangphruk
Keyword(s):  
Thin Film ◽  
Graphene Oxide ◽  
Hydrogen Evolution ◽  
Chemical Vapour Deposition ◽  
Hydrogen Evolution Reaction ◽  
Vapour Deposition ◽  
Nickel Foam ◽  
Chemical Vapour ◽  
Ni Foam ◽  
Acidic Electrolyte

In this study, a graphene oxide (GO) carbocatalyst was synthesized as a thin film on a 3D Ni foam substrate (GO@Ni) by oxidative chemical vapour deposition (CVD) using methanol and water as precursors.

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