Role of Substrate Temperature on the Properties of Microcrystalline Silicon Thin Films

2001 ◽  
Vol 40 (Part 1, No. 11) ◽  
pp. 6284-6289 ◽  
Author(s):  
Sumita Mukhopadhyay ◽  
Subhas Chandra Saha ◽  
Swati Ray
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films

The Study of Microcrystalline Silicon Thin Films Prepared by PECVD

2013 ◽  
Vol 537 ◽  
pp. 197-200
Author(s):  
Chun Ya Li ◽  
Hao Zhang ◽  
Jun Li ◽  
Xi Feng Li ◽  
Jian Hua Zhang
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Process Parameters ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Crystalline Volume Fraction ◽  
Microcrystalline Silicon ◽  
Reaction Pressure ◽  
Silicon Thin Films

Under different growth conditions, microcrystalline silicon thin films are deposited successfully on glass substrates by the double-frequency plasma enhanced chemical vapor deposition (PECVD). We report the systematic investigation of the effect of process parameters (hydrogen dilution, substrate temperature, forward power, reaction pressure, et al.) on the growth characteristics of microcrystalline silicon thin films. Raman scattering spectra are used to analyze the crystalline condition of the films and the experimental results. Optimizing the process parameters, the highest crystalline volume fraction of microcrystalline silicon films was achieved. It is found that the crystalline volume fraction of microcrystalline silicon films reaches 72.2% at the reaction pressure of 450 Pa, H2/SiH4 flow ratio of 800sccm/10sccm, power of 400 W and substrate temperature of 350 °C.

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

2013 ◽  
Vol 113 (20) ◽  
pp. 203505 ◽  
Author(s):  
Y. N. Guo ◽  
D. Y. Wei ◽  
S. Q. Xiao ◽  
S. Y. Huang ◽  
H. P. Zhou ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Microcrystalline Silicon ◽  
Inductively Coupled ◽  
Silicon Thin Films

New two-step growth of microcrystalline silicon thin films without incubation layer

2011 ◽  
Vol 322 (1) ◽  
pp. 1-5 ◽  
Author(s):  
Hongyun Yue ◽  
Aimin Wu ◽  
Xueyu Zhang ◽  
Tingju Li
Keyword(s):  
Thin Films ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films ◽  
Step Growth
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