Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields

1991 ◽  
Vol 30 (Part 1, No. 4) ◽  
pp. 882-885 ◽  
Author(s):  
Haruo Shindo ◽  
Tetsuro Hashimoto ◽  
Yasuhiro Horiike
Keyword(s):  
Magnetic Fields ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Low Pressure ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Ion Energy ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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