Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

J. Ding; J.‐S. Jenq; G.‐H. Kim; H. L. Maynard; J. S. Hamers; N. Hershkowitz; J. W. Taylor

doi:10.1116/1.578540

Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578540 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1283-1288 ◽

Cited By ~ 65

Author(s):

J. Ding ◽

J.‐S. Jenq ◽

G.‐H. Kim ◽

H. L. Maynard ◽

J. S. Hamers ◽

...

Keyword(s):

Energy Flux ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Etching Rate ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Atomic Fluorine ◽

Resonance Plasma

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Characterization of He-induced Bubble Formation in Tungsten due to Exposure from an Electron Cyclotron Resonance Plasma Source

Fusion Science & Technology ◽

10.1080/15361055.2017.1333856 ◽

2017 ◽

pp. 1-10 ◽

Cited By ~ 2

Author(s):

D. Donovan ◽

D. Buchenauer ◽

J. Whaley ◽

G. Wright ◽

C.M. Parish ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bubble Formation ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Picosecond time-resolved photoluminescence characterization of a-SiC:H films prepared by electron cyclotron resonance plasma

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80255-8 ◽

1991 ◽

Vol 137-138 ◽

pp. 859-862 ◽

Cited By ~ 4

Author(s):

S. Gangopadhyay ◽

M. Pleil ◽

W. Borst ◽

C. Young ◽

M. Kristiansen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Time Resolved ◽

Time Resolved Photoluminescence ◽

Resonance Plasma

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Modeling of plasma density, argon ion energy and ion velocity functions in a dipolar electron cyclotron resonance plasma source

Vacuum ◽

10.1016/j.vacuum.2020.109215 ◽

2020 ◽

Vol 174 ◽

pp. 109215

Author(s):

Bin Zhang ◽

Xiaobing Zhang

Keyword(s):

Plasma Density ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Ion Velocity ◽

Argon Ion ◽

Resonance Plasma

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Characterization of a high-density electron-cyclotron resonance plasma source operating in nitrogen

Review of Scientific Instruments ◽

10.1063/1.1578154 ◽

2003 ◽

Vol 74 (7) ◽

pp. 3279-3283 ◽

Cited By ~ 5

Author(s):

E. I. Toader ◽

A. Fredriksen ◽

A. Aanesland

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Characterization of a large volume electron cyclotron resonance plasma for etching and deposition of materials

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578239 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1276-1280 ◽

Cited By ~ 8

Author(s):

A. Ghanbari ◽

M. S. Ameen ◽

R. S. Heinrich

Keyword(s):

Large Volume ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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00/02894 Preparation and characterization of ZrF4-BaF2-EuF3 planar glass films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Fuel and Energy Abstracts ◽

10.1016/s0140-6701(00)96807-3 ◽

2000 ◽

Vol 41 (5) ◽

pp. 319-320

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Glass Films

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ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

ChemInform ◽

10.1002/chin.199002353 ◽

1990 ◽

Vol 21 (2) ◽

Author(s):

NGUYEN SON VAN NGUYEN SON VAN ◽

K. ALBAUGH

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Characterization of GaAs(110) Nitrided by an Electron-Cyclotron Resonance Plasma Source Using N[sub 2]

Journal of The Electrochemical Society ◽

10.1149/1.1393260 ◽

2000 ◽

Vol 147 (2) ◽

pp. 731

Author(s):

D. Landheer ◽

K. Rajesh ◽

J. E. Hulse ◽

G. I. Sproule ◽

J. McCaffrey ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Modeling and characterization of etching in electron cyclotron resonance plasma reactors

Journal of Fusion Energy ◽

10.1007/bf01054828 ◽

1993 ◽

Vol 12 (4) ◽

pp. 403-404

Author(s):

Martin Lampe

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Reactors ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Influence of mixture compositions on ion energy distributions in Ar/N2 electron cyclotron resonance plasma

Vacuum ◽

10.1016/j.vacuum.2015.05.020 ◽

2015 ◽

Vol 119 ◽

pp. 174-178 ◽

Cited By ~ 2

Author(s):

Y.C. Zhang ◽

X.H. Xie ◽

H. Li ◽

K. Yang ◽

Z.L. Tang ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Energy Distributions ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Ion Energy Distributions ◽

Resonance Plasma

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