High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition

Applied Physics Express ◽

10.1143/apex.1.034004 ◽

2008 ◽

Vol 1 ◽

pp. 034004 ◽

Cited By ~ 16

Author(s):

Yuichi Yamazaki ◽

Naoshi Sakuma ◽

Masayuki Katagiri ◽

Mariko Suzuki ◽

Tadashi Sakai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00921-0 ◽

2003 ◽

Vol 167 (2-3) ◽

pp. 288-291 ◽

Cited By ~ 17

Author(s):

D.J. Yang ◽

Q. Zhang ◽

S.F. Yoon ◽

J. Ahn ◽

S.G. Wang ◽

...

Keyword(s):

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349732 ◽

1991 ◽

Vol 70 (12) ◽

pp. 7374-7381 ◽

Cited By ~ 94

Author(s):

H. Kakinuma ◽

M. Mohri ◽

M. Sakamoto ◽

T. Tsuruoka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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Point‐Arc Remote Plasma Chemical Vapor Deposition for High‐Quality Single‐Crystal Diamond Selective Growth

physica status solidi (a) ◽

10.1002/pssa.201900227 ◽

2019 ◽

Vol 216 (21) ◽

pp. 1900227

Author(s):

Wenxi Fei ◽

Masafumi Inaba ◽

Haruka Hoshino ◽

Ikuto Tsuyusaki ◽

Sora Kawai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Chemical Vapor ◽

Selective Growth ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

High Quality Single Crystal ◽

Single Crystal Diamond

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Multi-walled carbon nanotube growth on oxidized silicon substrates using cyclohexane precursor by chemical vapor deposition

Materials Letters ◽

10.1016/j.matlet.2007.01.108 ◽

2007 ◽

Vol 61 (21) ◽

pp. 4301-4304 ◽

Cited By ~ 4

Author(s):

Bharath Thiruvengadachari ◽

Pratul K. Ajmera

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Substrates ◽

Multi Walled Carbon Nanotube ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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INFLUENCE OF THE SUBSTRATE TYPES AND TREATMENTS ON CARBON NANOTUBE GROWTH BY CHEMICAL VAPOR DEPOSITION WITH NICKEL CATALYST

Carbon Nanotubes - NATO Science Series II: Mathematics, Physics and Chemistry ◽

10.1007/1-4020-4574-3_12 ◽

2006 ◽

pp. 61-62

Author(s):

R. RIZZOLI ◽

R. ANGELUCCI ◽

S. GUERRI ◽

F. CORTICELLI ◽

M. CUFFIANI ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Nickel Catalyst ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Nanotube Growth ◽

Nanotube Growth ◽

Substrate Types

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Low Temperature Heteroepitaxial Growth of 3C-SiC on Silicon Substrates by Triode Plasma Chemical Vapor Deposition using Dimethylsilane

Journal of Applied Sciences ◽

10.3923/jas.2008.3523.3527 ◽

2008 ◽

Vol 8 (19) ◽

pp. 3523-3527 ◽

Cited By ~ 3

Author(s):

A.M. Hashim ◽

K. Yasui

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Substrates ◽

Heteroepitaxial Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Dynamics of catalyst particle formation and multi-walled carbon nanotube growth in aerosol-assisted catalytic chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2010.06.045 ◽

2010 ◽

Vol 48 (13) ◽

pp. 3807-3816 ◽

Cited By ~ 48

Author(s):

C. Castro ◽

M. Pinault ◽

S. Coste-Leconte ◽

D. Porterat ◽

N. Bendiab ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Catalyst Particle ◽

Particle Formation ◽

Catalytic Chemical Vapor Deposition ◽

Multi Walled Carbon Nanotube ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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Correlation between the Carbon Nanotube Growth Rate and Byproducts in Antenna‐Type Remote Plasma Chemical Vapor Deposition Observed by Vacuum Ultraviolet Absorption Spectroscopy

Small ◽

10.1002/smll.201901504 ◽

2019 ◽

Vol 15 (48) ◽

pp. 1901504 ◽

Cited By ~ 1

Author(s):

Masafumi Inaba ◽

Takumi Ochiai ◽

Kazuyoshi Ohara ◽

Ryogo Kato ◽

Tasuku Maki ◽

...

Keyword(s):

Growth Rate ◽

Vapor Deposition ◽

Vacuum Ultraviolet ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Antenna Type ◽

Ultraviolet Absorption Spectroscopy ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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Analysis of Oxidation State of Multilayered Catalyst Thin Films for Carbon Nanotube Growth Using Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.8323 ◽

2006 ◽

Vol 45 (10B) ◽

pp. 8323-8329 ◽

Cited By ~ 25

Author(s):

Atsushi Okita ◽

Atsushi Ozeki ◽

Yoshiyuki Suda ◽

Junji Nakamura ◽

Akinori Oda ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Oxidation State ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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Low-Temperature Synthesis of Diamond Films in Thermoassisted RF Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.1428 ◽

1992 ◽

Vol 31 (Part 1, No. 5A) ◽

pp. 1428-1431 ◽

Cited By ~ 13

Author(s):

Ichiro Watanabe ◽

Takashi Matsushita ◽

Koujyu Sasahara

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Rf Plasma ◽

Plasma Chemical ◽

Low Temperature Synthesis ◽

Temperature Synthesis ◽

Plasma Chemical Vapor Deposition

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