Measurements of deep trap concentration in diodes with a high Schottky barrier by deep-level transient spectroscopy

2002 ◽  
Vol 36 (6) ◽  
pp. 655-658
Author(s):  
E. N. Agafonov ◽  
A. N. Georgobiani ◽  
L. S. Lepnev
1986 ◽  
Vol 71 ◽  
Author(s):  
K. Nauka ◽  
Jun Amano ◽  
M.P. Scott ◽  
E.R. Weber ◽  
J.E. Turner ◽  
...  

AbstractDeep level transient spectroscopy (DLTS) in conjunction with other analytical techniques was used to establish a correlation between the leakage current in the TiSi2/p+/n-Si shallow diodes (0.25 micron) and the Ti-related Ec - 0.23 eV deep trap. It was found that Ti diffused into the junction region durin the TiSi2 formation and caused leakage currents with values up to 2 × 10−8 A/cm2. Further increases of the leakage current were related to the formation of a TiSi2/n-Si Schottky barrier.


2017 ◽  
Vol 56 (4S) ◽  
pp. 04CG01 ◽  
Author(s):  
Philippe Ferrandis ◽  
Matthew Charles ◽  
Yannick Baines ◽  
Julien Buckley ◽  
Gennie Garnier ◽  
...  

1996 ◽  
Vol 35 (Part 1, No. 6A) ◽  
pp. 3374-3375
Author(s):  
Koji Sato ◽  
Katsuhiko Suno ◽  
Hideo Wada ◽  
Yoichi Okamoto ◽  
Jun Morimoto ◽  
...  

2007 ◽  
Vol 994 ◽  
Author(s):  
Jinggang Lu ◽  
Yongkook Park ◽  
George A Rozgonyi

AbstractExamination of dislocations in the as-grown and annealed SiGe/Si heterostructures by DLTS indicates the three strong DLTS bands from 70 to 270K in the as-grown sample are likely related to intrinsic point defects or dislocation trails. A small amount of Fe at dislocations dramatically increases their electrical activity, and the trap concentration due to Fe-decorated dislocations can well exceed the total Fe impurities presented along dislocations. Through examining the competitive trapping of Fe at boron and dislocations, it is suggested that Fe trapping only happens at disordered sites along dislocations, such as kinks.


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