High-power extreme ultraviolet source based on a Z-pinch

1999 ◽  
Author(s):  
Malcolm W. McGeoch
Keyword(s):  
High Power ◽  
Extreme Ultraviolet ◽  
Z Pinch

HIGH-POWER EUV SOURCE FOR LITHOGRAPHY USING A TIN TARGET

2006 ◽  
Vol 05 (06) ◽  
pp. 677-682 ◽  
Author(s):  
C. H. ZHANG ◽  
S. KATSUKI ◽  
A. KIMURA ◽  
H. HORITA ◽  
T. NAMIHIRA ◽  
...  
Keyword(s):  
Conversion Efficiency ◽  
High Power ◽  
Extreme Ultraviolet ◽  
Capillary Discharge ◽  
High Conversion Efficiency ◽  
Euv Emission ◽  
Pinhole Imaging ◽  
Background Gas ◽  
Next Generation Lithography ◽  
Z Pinch

Xenon capillary discharge sources are being developed for extreme ultraviolet (EUV) light for next generation lithography. However, the current sources generate in-band (2%), 2π EUV emission with conversion efficiency (CE) of <1%. Here we report progress in the development of a Z-pinch EUV source using a tin target, which was found to have significant potential for high conversion efficiency with wavelength of 13.5 nm. Xenon was used as the background gas, the experiments show that the magnitude of the EUV emission depended on not only the distance between the plasma and the rod surface, but also the pulse repetition rate of the discharge. Pinhole imaging, an EUV spectrograph and an in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge.

High-Power GDPP Z-Pinch EUV Source Technology

2010 ◽  
pp. 413-452 ◽  
Author(s):  
Uwe Stamm ◽  
Guido Schriever ◽  
Jürgen Kleinschmidt
Keyword(s):  
High Power ◽  
Z Pinch

Effects of an axial magnetic field on Z-pinch plasmas for extreme ultraviolet sources

2006 ◽  
Vol 99 (1) ◽  
pp. 013305 ◽  
Author(s):  
Sunao Katsuki ◽  
Akihiro Kimura ◽  
Yoshihiro Kondo ◽  
Hiroyuki Horita ◽  
Takao Namihira ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Extreme Ultraviolet ◽  
Axial Magnetic Field ◽  
Z Pinch

Formation of tight plasma pinches and generation of high-power soft x-ray radiation pulses in fast Z-pinch implosions

Laser Physics ◽  
2006 ◽  
Vol 16 (1) ◽  
pp. 183-193 ◽  
Author(s):  
A. V. Shishlov ◽  
R. B. Baksht ◽  
S. A. Chaikovsky ◽  
A. V. Fedunin ◽  
F. I. Fursov ◽  
...  
Keyword(s):  
High Power ◽  
X Ray ◽  
Z Pinch

scholarly journals Simulation and mitigation of the magneto-Rayleigh-Taylor instabilities in Z-pinch gas discharge extreme ultraviolet plasma radiation sources

2013 ◽  
Vol 20 (11) ◽  
pp. 112113 ◽  
Author(s):  
B. Huang ◽  
T. Tomizuka ◽  
B. Xie ◽  
Y. Sakai ◽  
Q. Zhu ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Gas Discharge ◽  
Plasma Radiation ◽  
Radiation Sources ◽  
Z Pinch

Characteristics of Xenon Capillary Z-Pinch Extreme Ultraviolet Lithography Source Driven by DifferentdI/dtDischarge Current Pulses

2005 ◽  
Vol 44 (12) ◽  
pp. 8640-8645 ◽  
Author(s):  
Inho Song ◽  
Kazuhiro Iwata ◽  
Yusuke Homma ◽  
Smruti Ranjan Mohanty ◽  
Masato Watanabe ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Current Pulses ◽  
Z Pinch

Laser assisted heating of extreme ultraviolet-emitting z-pinch plasmas

2008 ◽  
Vol 15 (12) ◽  
pp. 122508 ◽  
Author(s):  
Stephan Wieneke ◽  
Stephan Brückner ◽  
Wolfgang Viöl
Keyword(s):  
Extreme Ultraviolet ◽  
Z Pinch
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